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Measuring rod with a reflective phase jitter

A phase grating and reflective technology, which can be applied to diffraction gratings, use optical devices to transmit sensing components, convert sensor outputs, etc., and can solve problems such as high manufacturing costs.

Inactive Publication Date: 2011-03-23
DR JOHANNES HEIDENHAIN GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The scale has between 8 and 14 layers and is expensive to manufacture

Method used

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  • Measuring rod with a reflective phase jitter
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Embodiment Construction

[0013] An essential component of the phase grating is the layer stack 3 , which consists of alternating low-refractive silicon dioxide layers 5 a , 5 b and high-refractive silicon layers 6 , 7 . Layer stacks of such dielectrics are well known in optics and reflect incident light of a defined wavelength very well when the thickness of the individual layers is matched to the wavelength of light.

[0014] In order to further increase the reflectivity of the phase grating, a nickel-chromium alloy (NiCr80 / 20) underlayer 4 facing the substrate is present in the layer stack 3 . On this NiCr80 / 20 layer 4 with a thickness of approximately 100 nm, there is provided a silicon dioxide layer 5 a with a thickness of 157 nm, followed by a silicon layer 6 with a thickness of 45 nm. The additional silicon dioxide layer 5b lying thereon has a thickness of 95 nm.

[0015] For the light with a wavelength of 850 nm for scanning scale 1, the above-mentioned layer thicknesses are optimized such tha...

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Abstract

The invention relates to a scale with reflection type phase raster, the said raster being with alternant high refracting layer (6,7) and low refracting layer (5a,5b) as reflecting layer stack (3), and the said reflecting layer stack is set on the basis (2). The high refracting layer (6,7) is composed of silicon, the low refracting layer (5a,5b) is composed of silicon dioxide.

Description

technical field [0001] The invention relates to a scale with a reflective phase grating. This scale is used in high-precision interferometric position measurement systems. Background technique [0002] With the further development of position measurement systems based on optical scale scanning, the requirements for such scales are getting higher and higher. In addition to a grating structure that is as fine as possible, i.e. the grating constant of the grating structure in the measuring direction is already in the sub-micrometer range and thus enables the measuring distance to be in the sub-nanometer range, the scale grating must also have the best possible reflexes. For this reason, phase gratings for high-precision normal-incidence systems are used, which reflect the incident light as completely as possible. [0003] In state-of-the-art position measuring systems, such as that described in EP 1319170 B1, the light from the light source is deflected several times before ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G01D5/38
CPCG01D5/38G01D5/34707
Inventor 格奥尔格·弗拉特舍尔
Owner DR JOHANNES HEIDENHAIN GMBH