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Micro-electro mechanical system device and method of forming comb electrodes of the same

A technology of micro-electromechanical system and comb-shaped electrode, which is applied in the directions of micro-electronic micro-structure device, micro-structure device, manufacturing micro-structure device, etc., can solve problems such as distortion and image wrinkling.

Inactive Publication Date: 2007-12-19
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Wrinkles and distortion appear on the image due to the non-linear relationship between light scanning angle and driving voltage

Method used

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  • Micro-electro mechanical system device and method of forming comb electrodes of the same
  • Micro-electro mechanical system device and method of forming comb electrodes of the same
  • Micro-electro mechanical system device and method of forming comb electrodes of the same

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Embodiment Construction

[0018] Microelectromechanical systems (MEMS) devices and methods of forming comb electrodes of the MEMS devices will now be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. FIG. 5 is a perspective view illustrating a MEMS device according to an embodiment of the present invention. Referring to FIG. 5 , the MEMS device includes: a platform 115 operating in a rotation mode; a torsion bar 113 around which the platform 115 rotates; and a frame 130 rotatably supporting the platform 115 by means of the torsion bar 113 . A plurality of driving comb electrodes 111 and a plurality of fixed comb electrodes 131 are formed between opposing surfaces of the platform 115 and the frame 130 . Specifically, the driving comb electrodes 111 extend parallel to each other from both sides of the platform 115 toward the frame 130 . The fixed comb electrodes 131 uniformly extend parallel to each other from the inner surface o...

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Abstract

A micro-electro mechanical system (MEMS) device and a method of forming comb electrodes of the MEMS device are provided. The method includes forming a plurality of parallel trenches at regular intervals in one side of a first silicon substrate so as to define alternating first and second regions at different heights on the one side of the first silicon substrate, oxidizing the first silicon substrate in order to form an oxide layer in the first and second regions having different heights, forming a polysilicon layer on the oxide layer to at least fill up the trenches so as to level the oxide layer having different heights, bonding a second silicon substrate directly to a top surface of the polysilicon layer, selectively etching the second silicon substrate and the polysilicon layer using a first mask so as to form upper comb electrodes vertically aligned with the first regions, selectively etching the first silicon substrate using a second mask so as to form lower comb electrodes vertically aligned with the second regions, and removing the oxide layer interposed between the upper comb electrodes and the lower comb electrodes.

Description

technical field [0001] The present invention relates to a microelectromechanical system (MEMS) device and a method of forming comb electrodes of the MEMS device, and more particularly, the present invention relates to a MEMS having an improved comb electrode structure exhibiting linear input-output characteristics Device and method of forming comb electrodes of the MEMS device. Background technique [0002] In various technical fields related to display devices, laser printers, precision measuring instruments, finishing devices, etc., much research is being conducted to develop small-sized MEMS devices manufactured using microfabrication techniques. For example, in a display device, a MEMS device is used as an optical scanner to reflect or deflect a scanning beam onto a screen. [0003] A MEMS device used as an optical scanner of a display device has a drive structure configured with interlocking comb electrodes. 1A to 1E are views for explaining a conventional method of f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00G02B26/10B81B5/00
CPCB81C1/00698B81B3/0086G02B26/0841B81B2203/0136B81B2201/04
Inventor 郑锡焕姜锡镇崔蓥郑贤九
Owner SAMSUNG ELECTRONICS CO LTD