Gas-adsorbing substance, gas-adsorbing alloy and gas-adsorbing material
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- PANASONIC CORP
- Publication Date
- 2012-08-15
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Abstract
Description
technical field
[0001] The present invention relates to a gas-adsorbing material, a gas-adsorbing alloy, and a gas-adsorbing material containing the gas-adsorbing material and / or gas-adsorbing alloy (hereinafter collectively referred to as "gas-adsorbing material, etc."). Background technique
[0002] Gas-adsorbing substances and the like are used in various fields such as vacuum maintenance, removal of trace gases in rare gases, and removal of gases in fluorescent lamps.
[0003] Rare gases used in the semiconductor manufacturing industry are expected to be purified to high purity by removing nitrogen, hydrocarbons, carbon monoxide, carbon dioxide, oxygen, hydrogen, water vapor, etc. in the rare gases. In particular, it is difficult to remove nitrogen, which is a stable molecule.
[0004] As a conventional method for removing nitrogen or hydrocarbons in a rare gas, for example, there is a method of contacting a getter material of a ternary alloy composed of zirconium, vana...