Mask plate and matching method of photo-etching machine nesting precision using mask plate
A technology of overlay accuracy and mask plate, which is applied in the field of overlay accuracy matching, can solve problems affecting the production efficiency of lithography machines, and achieve the effect of saving matching time and improving product yield
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0009] Embodiments of the present invention are described below, so that the purpose, specific structural features and advantages of the invention can be further understood.
[0010] The invention provides a new reticle, the reticle has multiple types of alignment marks, and different types of alignment marks are located at different positions of the reticle to match with different alignment systems. The type of manufacturing reticle alignment mark is determined according to its scope of use. For example, if the wafer to be processed is divided into three types according to the lithography machine used for the front-end process, since different types of lithography machines have different types of alignment system and alignment method, therefore, three types of alignment marks that match the alignment marks on the wafer need to be etched on the reticle of the present invention. With this type of reticle, there is no need to replace the photolithography machine and the reticle ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com