Double offset parameter circle contour measurement model and biased error separation method

A technology of profile measurement and offset error, applied in measurement devices, instruments, etc., can solve problems such as not being raised and affecting measurement accuracy, and achieve the effect of improving accuracy, avoiding principle defects, and solving principle defects

Inactive Publication Date: 2009-01-07
HARBIN INST OF TECH
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Problems solved by technology

[0005] Taiwanese scholar Cha′o-Kuang Chen simply mentioned that the offset error of the sensor probe will affect the accuracy of the measurement in the precision measurement of roundness, but did not propose how to accurately solve the error (Cha ′o-Kuang Chen. The study on the error separation and eccentricity self-compensation methods for improving the precision of a roundness machine. Proceedings of the Second International Symposium on Instrumentation Science and Technology, 2002, (1), 459-465)

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  • Double offset parameter circle contour measurement model and biased error separation method
  • Double offset parameter circle contour measurement model and biased error separation method
  • Double offset parameter circle contour measurement model and biased error separation method

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Embodiment Construction

[0034] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0035] Such as figure 1 As shown, it is the circular profile measurement model with double offset parameters proposed by the present invention. In addition to the eccentricity error (e, α) of the tested piece introduced in the traditional measurement model, the sensor head offset error d is also introduced in this model, That is, when the sensor measurement direction does not pass the instrument to measure the center of rotation o 1 , but offset d within the measurement section, and the center of the least square circle of the measured section of the tested piece o 2 and measuring the center of gyration o 1 When there is no overlap and the eccentricity of the tested piece is e, the sensor measured is not relative to the measurement center of rotation o 1 The polar radius r i , but with respect to the instantaneous center of measurement o′ and the pol...

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Abstract

A double offset parameter circle contour measurement model and an offset error separation method belong to the technical field of surface shape measurement. The model simultaneously includes two offset error components: offset error of the detected component (e, Alpha) and offset error d of the measuring head of a sensor. The measurement model is that Rho i is equal to ecos(Theta i-Alpha)+((ro+Delta ri)<2>-(d+esin(Theta i - Alpha))<2>)<1/2>. The method of parameter optimization is adopted to realize accurate estimation and direct solving of offset error parameters and other parameters in the model, thus separating the offset parameters one by one from the measuring data and acquiring the actual circle contour of the detected piece. The measurement model provided by the invention can completely and accurately reflect the influence of the offset error parameters to the measurement of the circle contour and overcome the problems of principle defect and low parameter estimation accuracy existed in the generally used measurement model at the present time.

Description

technical field [0001] The invention belongs to the technical field of surface shape measurement, in particular to a method for separating a circular profile measurement model with double offset parameters and an offset error. Background technique [0002] Roundness error is an important technical parameter to control the quality of rotary parts. With the rapid development of precision engineering technology and national defense cutting-edge technology, a large number of ultra-precision rotating body parts are widely used, such as circular standards used for comparison and calibration - the roundness error of the designated circular section of the quartz standard hemisphere is generally 5nm ~ 50nm Between; the roundness of the electrostatic levitation gyro rotor is required to be within 10nm, all of which put forward extremely high requirements for the ultra-precision measurement of the roundness error. [0003] Offset error is an important source of error affecting the ult...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B21/20G01B21/24
Inventor 谭久彬黄景志
Owner HARBIN INST OF TECH
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