Mask plate and forming method of the mask plate

A mask and pattern area technology, applied in the field of semiconductor manufacturing, can solve problems such as small process window, and achieve the effects of improving resolution, improving process window size, and improving formation quality
CN101359167AInactive Publication Date: 2009-02-04SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SEMICON MFG INT (SHANGHAI) CORP
Publication Date
2009-02-04
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a masking board which comprises a light transmission substrate; the light transmission substrate is provided with at least a graphics area which can shade the exposure light; wherein, a notch of a phase shift grating is arranged on the light transmission substrate in at least a graphics area; and the notch is provided with light transmittance to the exposure light. The invention also discloses a corresponding forming method of the masking board. The application of the masking board can improve the resolution, focal depth and graphics contrast in the lithography process, and increase the process window.
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Description

technical field

[0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a mask and a method for forming the mask. Background technique

[0002] In the semiconductor manufacturing process, the photolithography process is at the center and is the most important process step in the production of integrated circuits. The production of semiconductor chips is usually divided into multiple layers. Before the chip is manufactured, one or more photolithographic masks (masks) are designed and manufactured according to the layout of the devices, metal lines, connections, etc. of each layer on the chip. Then, The pattern on the photolithography mask plate is transferred to the wafer by photolithography process.

[0003] The photolithography mask, also known as a reticle or a mask, is a light-transmitting substrate that is transparent to exposure light, and has at least one geometric figure (graphic area) that is light-shielding to exposure l...

Claims

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