Mask plate and forming method of the mask plate

A mask and pattern area technology, applied in the field of semiconductor manufacturing, can solve problems such as small process window, and achieve the effects of improving resolution, improving process window size, and improving formation quality

Inactive Publication Date: 2009-02-04
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] The invention provides a mask plate and a method for forming the mask plate, so as to improve the resolution of the existing photolithography technology and improve the problem that the process window of the existing photolithography technology is small

Method used

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  • Mask plate and forming method of the mask plate
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  • Mask plate and forming method of the mask plate

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Embodiment Construction

[0051] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0052] The processing method of the present invention can be widely used in various fields, and can utilize many suitable materials to make, and the following is to illustrate by specific embodiment, certainly the present invention is not limited to this specific embodiment, in this field Common replacements known to those of ordinary skill undoubtedly fall within the protection scope of the present invention.

[0053] Secondly, the present invention is described in detail using schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of explanation, each schematic diagram will not be partially enlarged according to the general scale, which should not be used as a limitation of the pres...

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Abstract

The invention discloses a masking board which comprises a light transmission substrate; the light transmission substrate is provided with at least a graphics area which can shade the exposure light; wherein, a notch of a phase shift grating is arranged on the light transmission substrate in at least a graphics area; and the notch is provided with light transmittance to the exposure light. The invention also discloses a corresponding forming method of the masking board. The application of the masking board can improve the resolution, focal depth and graphics contrast in the lithography process, and increase the process window.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a mask and a method for forming the mask. Background technique [0002] In the semiconductor manufacturing process, the photolithography process is at the center and is the most important process step in the production of integrated circuits. The production of semiconductor chips is usually divided into multiple layers. Before the chip is manufactured, one or more photolithographic masks (masks) are designed and manufactured according to the layout of the devices, metal lines, connections, etc. of each layer on the chip. Then, The pattern on the photolithography mask plate is transferred to the wafer by photolithography process. [0003] The photolithography mask, also known as a reticle or a mask, is a light-transmitting substrate that is transparent to exposure light, and has at least one geometric figure (graphic area) that is light-shielding to exposure l...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F1/14G03F1/26
Inventor 张飞
Owner SEMICON MFG INT (SHANGHAI) CORP
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