Twin-fluid nozzle for cleaning substrate

A dual-fluid nozzle and dual-fluid technology, applied in the direction of liquid injection devices, cleaning methods and appliances, spraying devices, etc., can solve the problems of lower cleaning efficiency and inability to generate uniform-sized dual-fluid droplets, etc., to improve cleaning efficiency and stabilize pressure and flow, improve the effect of spray uniformity

Inactive Publication Date: 2009-02-25
K C TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, the existing two-fluid nozzle adopts the method of supplying the cleaning liquid and the drying air to the inside of the main body 10 and then simply mixing them, so that the two-fluid droplets of uniform size cannot be generated, thus reducing the cleaning efficiency.
In particular, a large number of air bubbles are generated due to the stagnation of the two-fluid at the portion where the transfer channel 13 is bent at a right angle, so that the size of the two-fluid droplet cannot be sufficiently atomized, so that the existing two-fluid nozzle is not enough for fine particles. cleaning process

Method used

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  • Twin-fluid nozzle for cleaning substrate
  • Twin-fluid nozzle for cleaning substrate
  • Twin-fluid nozzle for cleaning substrate

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Embodiment Construction

[0016] Hereinafter, preferred embodiments of the two-fluid nozzle for cleaning a substrate provided by the present invention will be described in detail with reference to the accompanying drawings.

[0017] figure 2 It is a cross-sectional view and a partially enlarged cross-sectional view of a dual-fluid nozzle for cleaning a substrate according to an embodiment of the present invention.

[0018] Such as figure 2 As shown, the dual-fluid nozzle for substrate cleaning provided by the embodiment of the present invention includes: a first housing part 100 and a second housing part 200 for respectively housing different fluids; The first injection port 111 for the first fluid; the second passage 210, which has the second injection port 211 for injecting the second fluid, and the dual-fluid discharge part 400, for injecting the dual fluid produced by mixing the first fluid and the second fluid. fluid.

[0019] The above structure will be described in detail as follows.

[00...

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Abstract

The invention discloses a double-fluid nozzle for substrate cleaning, the nozzle comprises: a first accommodation section and a second accommodation section for respectively accommodating mutually distinct fluids; a first channel for transferring a first fluid accommodated in the first accommodation section, a first jet orifice for jetting the first fluid is formed at one end thereof; a second channel for transferring second fluid accommodated in the second accommodation section, a second jet orifice for jetting the second fluid is formed at one end thereof; a double-fluid drainage section for draining the double-fluid which is generated by mixing the fluids jetted from the first and the second jet orifices; and a guide section formed at a front end of the second jet orifice and for guiding the jetting direction of the second fluid jetted from the second jet orifice to the first jet orifice. In accordance with the invention, the micronic and uniform double-fluid is generated by mixing the dry air with a washing liquid that is smashed to ultramicronic droplets, so as to prominently improve washing efficiency for the substrate.

Description

technical field [0001] The invention relates to a two-fluid nozzle for substrate cleaning, in particular to a two-fluid nozzle for substrate cleaning which mixes and amplifies two fluids and sprays them onto the substrate surface. Background technique [0002] Usually, substrates used on flat panel displays (FPD: Flat Panel Display) such as semiconductor wafers or TFT-LCD (Thin Film Transistor-Liquid Crystal Display), PDP (Plasma Display Panel) and EL (Electro Luminescence) displays require high-precision processing It is particularly important to prevent defects during its manufacturing process. Moreover, with the development of larger screens today, the size of the substrates to be processed in the flat panel display manufacturing process also tends to be larger. In order to reduce the cost of manufacturing flat panel displays using such large-area substrates, research to minimize the defect rate in the manufacturing process is actively being conducted. [0003] In addit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05B7/04B08B3/02B08B3/04
CPCH01L21/67051
Inventor 金奭柱
Owner K C TECH
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