WS2/MoS2 solid lubrication multilayer film and method for making same
A solid lubricating, multi-layer film technology, applied in lubricating compositions, engine lubrication, solid diffusion coating, etc. problem, to achieve the effect of good nanomechanical properties, compact structure and novel structure
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Embodiment 1
[0054] (1) The matrix is quenched, the hardness is HRC55, and the surface roughness is 0.8μm;
[0055] (2) The target material is a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. W / Mo is made by alternately depositing W and Mo layers on the substrate in a dual-target radio frequency sputtering equipment Multilayer film, when the furnace vacuum reaches 2.5×10 -3 At this time, inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.0 Pa to start sputtering. The current is 1.0A; the dual-target radio frequency sputtering alternately deposits W and Mo layers to make W / Mo multilayer film. The thickness is determined by the residence time and the deposition rate of the substrate in front of the target in the dual-target radio frequency sputtering alternate deposition step. Control, the target distance is 60mm, when depositing the W layer, the residence time of the substrate in front of the W target is: 270 seconds...
Embodiment 2
[0076] (1) The matrix is quenched, the hardness is HRC55, and the surface roughness is 0.8μm;
[0077] (2) The target material is a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. W / Mo is made by alternately depositing W and Mo layers on the substrate in a dual-target radio frequency sputtering equipment Nano multilayer film, when the furnace vacuum reaches 2.75×10 -3 At Pa, inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.1 Pa to start sputtering. The current is 1.5A; the dual-target radio frequency sputtering alternately deposits W and Mo layers to make W / Mo nano multilayer film thickness. The residence time and deposition rate of the substrate in front of the target during the alternate deposition step of dual-target radio frequency sputtering To control, the target distance is 70mm, when the W layer is deposited, the residence time of the substrate in front of the W target is: 270 seconds, and the ...
Embodiment 3
[0096] (1) The matrix is quenched, the hardness is HRC55, and the surface roughness is 0.8μm;
[0097] (2) The target material is a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. W / Mo is made by alternately depositing W and Mo layers on the substrate in a dual-target radio frequency sputtering equipment Nano multilayer film, when the vacuum degree in the furnace reaches 3.0×10 -3 At Pa, inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.2 Pa to start sputtering. The current is 2A; the dual-target radio frequency sputtering alternately deposits W and Mo layers to make W / Mo nano multilayer film. The thickness is determined by the residence time and deposition rate of the substrate in front of the target in the dual-target radio frequency sputtering alternate deposition step. Control, the target distance is 80mm, when depositing the W layer, the residence time of the substrate in front of the W target is: ...
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