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Methods relating to immersion lithography and an immersion lithographic apparatus

A technology of lithography equipment and operation method, which is applied in the field of immersion lithography equipment and can solve problems such as undesired

Active Publication Date: 2009-04-15
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesirable or unexpected effects

Method used

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  • Methods relating to immersion lithography and an immersion lithographic apparatus
  • Methods relating to immersion lithography and an immersion lithographic apparatus
  • Methods relating to immersion lithography and an immersion lithographic apparatus

Examples

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Embodiment Construction

[0034] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam PB (e.g., ultraviolet radiation or extreme ultraviolet radiation); a support structure (e.g., a mask table) MT configured to support a patterning device (e.g., a mask) MA is also connected to a first positioner PM configured to precisely position the patterning device according to specific parameters; a substrate table (e.g., a wafer table) WT configured to hold a substrate (e.g., a resist-coated wafer) W, and connected to a second positioning device PW configured to precisely position the substrate according to specific parameters; and a projection system (e.g. a refractive projection lens system) PS configured to direct the radiation beam imparted by the patterning device MA to The pattern of PB is projected onto a target portion C of substrate W (eg, inc...

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PUM

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Abstract

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

Description

technical field [0001] The present invention relates to a method of operating a fluid confinement system and to an immersion lithography apparatus. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate a circuit pattern corresponding to a single layer of the IC. The pattern can be imaged onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Pattern imaging is performed by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are sequentially exposed. Known lithographic apparatuses include...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/70916G03F7/2041H01L21/0274
Inventor B·斯蒂夫克尔克R·F·德格拉夫J·C·H·马尔肯斯M·贝克尔斯P·P·J·伯克文斯D·L·安斯陶特兹
Owner ASML NETHERLANDS BV
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