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Temperature raising method and apparatus for reaction chamber

A technology of heating device and reaction chamber, which can be used in measurement devices, temperature control, electronic circuit testing, etc., and can solve problems such as time-consuming and energy-consuming

Inactive Publication Date: 2009-05-13
POWERTECH TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, this design of simply using a heater to raise the ambient temperature and evaporate water is very time-consuming and energy-consuming. For example, when the temperature is raised from 0 to 90 degrees, it takes 90 minutes to make the entire environment reach an isothermal state ; Therefore how to effectively reduce the heating time and can quickly reach the isothermal environment is the goal of the present invention

Method used

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  • Temperature raising method and apparatus for reaction chamber
  • Temperature raising method and apparatus for reaction chamber
  • Temperature raising method and apparatus for reaction chamber

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Embodiment Construction

[0023] Please refer to FIG. 1 which shows a schematic diagram of a reaction chamber heating method according to an embodiment of the present invention. A heater (heater) 12 is arranged in a reaction chamber (chamber). In this embodiment, the reaction chamber is a test chamber 10. Utilize heater 12 to heat the air in the test chamber 10; And fill into a dry air, as shown in arrow 14 among the figure, it is the injection and flow schematic diagram of dry air, makes dry air mix with the hot air after heating, and impels the test chamber The air flow (air flow) in 10 changes, as shown by arrow 16 in the figure, it is a schematic diagram of hot air flow; after that, due to the continuous filling of dry air, the pressure in the test chamber 10 becomes larger, and then the test chamber The air in 10 is discharged, as shown by arrow 18 among the figure, it is the schematic diagram of air discharge. In this embodiment, the discharged air is air containing moisture.

[0024] In the abov...

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Abstract

The invention relates to a reaction chamber heating-up method which comprises the following steps: air in a reaction chamber is heated; dry air is filled into the reaction chamber to be mixed with hot air; air containing moisture content is discharged. The invention also discloses a heat riser which has the advantages that the temperature in the reaction chamber can be increased in shorter time, the constant temperature environment can be reached, and further the cost is lowered.

Description

technical field [0001] The invention relates to a method for raising the temperature of a reaction chamber and a temperature raising device thereof, in particular, it can raise the temperature in a short time and reach a uniform temperature state. Background technique [0002] After the semiconductor element is manufactured, it enters a test procedure. During the test process, with the different performance of the semiconductor element, the test device can be divided into testing the semiconductor element in a high temperature, room temperature or low temperature environment. The general test device includes a soak chamber (soak chamber) ) for preheating or precooling semiconductor components, and a test chamber (test chamber) for testing the preheated or precooled semiconductor components. [0003] When semiconductor components must be tested under high temperature conditions, the environment of the preheating chamber and the test chamber must be at a set temperature in adv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R1/00G01R31/00G01R31/26G01R31/28G05D23/00
Inventor 吴明彦
Owner POWERTECH TECHNOLOGY