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Alloy splicing target

A technology of alloy target and alloy, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of long time and high cost of sputtering respectively, and achieve the effect of simple structure and fast preparation

Inactive Publication Date: 2011-07-27
SHENYANG INSTITUTE OF CHEMICAL TECHNOLOGY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this way, the cost of refining multiple alloy targets is relatively high, and the time for sputtering separately is also relatively long

Method used

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Experimental program
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Embodiment Construction

[0012] specific implementation plan

[0013] The components of the alloy target are determined according to the composition of the alloy film to be obtained, two components or three components. One component is used as the alloy matrix, and the other or two components are used as alloying elements, and the alloy target half with low alloying elements (A) and the alloy target with high alloying elements (B) are respectively refined, and A and B The two half-targets are processed to have the same thickness, and one end has a half-thickness step, and then the two half-block targets are spliced ​​into a whole alloy target such as figure 1 , figure 2 . During sputtering, the substrate corresponding to the alloy target is placed in layers from the low-alloy target area to the high-alloy target area. After sputtering, the film on the first layer of the substrate corresponding to the low-alloy target area contains low alloy elements and corresponds to the high-alloy target area. T...

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Abstract

An alloy splice target relates to a coating technology. Substrates are corresponding to the positions of different components of the target and placed in a layered way. The alloy splice target is characterized in that a whole plane sputtering target is formed by splicing a high alloy half target and a low alloy half target; the two half targets are respectively processed with steps and then jointed together. The alloy splice target has simple structure, can conveniently and quickly prepare alloy films with different components on the substrates by using one piece of alloy splice target and a sputtering test, and is economical and applicable.

Description

technical field [0001] The invention relates to a coating technology, in particular to an alloy splicing target which can conveniently and quickly prepare alloy films with different components. Background technique [0002] Magnetron sputtering technology is a technology that uses a magnetic field to control the plasma generated by glow discharge to bombard the particles on the surface of the target and deposit them on the surface of the substrate. It is one of the mainstream coating technologies today. It can be used for film formation of high melting point metals, alloys and compound materials. [0003] When studying the relationship between the composition and performance of the alloy film, it is often necessary to prepare alloy films with different compositions and conduct performance tests to optimize the composition of the alloy film. Usually, the alloy target of one composition is refined, and the alloy film of the corresponding composition is obtained after sputteri...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/35C23C14/14
Inventor 付广艳刘群
Owner SHENYANG INSTITUTE OF CHEMICAL TECHNOLOGY