Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-piezoelectric patch deformation reflection mirror with large-amplitude defocusing and astigmation calibration function

A technology of deformable mirrors and bimorphs, applied in optical components, optics, instruments, etc., can solve problems such as concerns and insufficient correction capabilities, and achieve low cost, outstanding correction capabilities, and easy-to-achieve effects

Inactive Publication Date: 2009-06-24
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, none of the above structures have given special consideration to low-order aberrations, especially the correction ability of defocus and astigmatism is not enough. For aberrations such as human eye imaging and ICF beam purification system, defocus astigmatism The system based on the system cannot achieve the real optimal correction effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-piezoelectric patch deformation reflection mirror with large-amplitude defocusing and astigmation calibration function
  • Double-piezoelectric patch deformation reflection mirror with large-amplitude defocusing and astigmation calibration function
  • Double-piezoelectric patch deformation reflection mirror with large-amplitude defocusing and astigmation calibration function

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0026] In this embodiment, a bimorph deformable mirror capable of correcting both large-scale defocus and astigmatic aberration is as follows: figure 1 As shown, the two sides of the driving layer 12 and the driving layer 13 made of two piezoelectric material sheets are plated with conductive metal electrodes (usually copper or silver), and then glued together; a piece of glass with a larger diameter (or Quartz, silicon, copper, etc.) material flake-shaped mirror layer 11 is bonded to the top again; a hollow cylinder mirror seat 17 that is also made of glass (or quartz, silicon, copper, etc.), its inner diameter is slightly smaller than the diameter of the driving layer Large, bonded to the lower surface of the mirror layer 11; such a structure allows the edges of the driving layer 12 and the driving layer 13 to be in a relatively free deform...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a double-piezoelectric plate deformed reflecting mirror for correcting large amplitude defocus and astigmatic image error, which comprises a specular layer, two drive layers and a microscope base. The reflecting mirror is characterized in that the two drive layers are formed by combining two circular wafers, wherein, a discrete electrode on one surface of one of the drive layers is divided into eight fan-shaped areas and used for correcting the large amplitude defocus and the astigmatic image error, and another discrete electrode on one surface of another drive layer is divided into more than ten small areas and used for correcting other higher-order aberration. The double-piezoelectric plate deformed reflecting mirror has more outstanding capacity of correcting the defocus and the astigmatic image error, simultaneously ensures the correction accuracy of the higher-order aberration, and is suitable for being applied to adaptive optical correction systems taking target aberration as main defocus and astigmatism. Furthermore, the double-piezoelectric plate deformed reflecting mirror has the advantages of simple structure, low processing difficulty, easy implementation, and lower cost.

Description

technical field [0001] The invention belongs to the technical field of wavefront correctors for adaptive optics systems, and relates to a double piezoelectric deformation mirror. Background technique [0002] The main purpose of adaptive optics technology is to detect and correct the wavefront distortion of the optical system in real time, so that the optical system can always maintain good optical performance. In all the aberrations that need to be corrected, defocus and astigmatism often account for the main components. For example, defocus and astigmatism account for 80% and 12.7% of the aberrations of the human eye respectively; defocus images in the wavefront error caused by atmospheric turbulence The scattered wavefront error is comparable to the sum of all higher-order errors. The key device in the adaptive optics system is the deformable mirror. The main types are: multi-element discrete piezoelectric deformable mirror, micro-deformable mirror based on MEMS (micro-e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B26/06
Inventor 姜文汉周虹官春林叶清秀张小军杨梅宁禹饶长辉
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products