Dithienothiophene dicarboxylic acid monomolecular layer and preparing method thereof
A technology of thiophene dicarboxylic acid monolayer and thiophene dicarboxylic acid, which is applied in the field of trithiophene dicarboxylic acid monolayer and its preparation, can solve the problems of uncontrollable structure, complicated operation, unfavorable material deviceization, etc., and achieve the preparation method Simple, easy to operate, conducive to the effect of device
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0023] Weigh 0.00284g of dithiophene[2,3-b:3′,2′-d]dithiophene dicarboxylic acid and dissolve it in 10ml dimethyl sulfoxide solution, and prepare 10 -3 mol L -1 The solution. Shake well in an airtight container to fully dissolve. The solution was gradually diluted to obtain 10 -6 mol L -1 Put the solution into a 10ml brown volumetric flask to fully dissolve it evenly. Then, the solution was dropped onto the freshly cleaved mica substrate using a microsyringe. Keep it in a closed and dry environment at a temperature of 20°C for 48 hours to dry naturally. Measured using the DFM mode of the atomic force microscope. The "flat-lying" dithiophene[2,3-b:3′,2′-d]thiophene dicarboxylic acid monolayer structure can be obtained, see figure 1 .
Embodiment 2
[0025] Weigh 0.00284g dithiophene[3,2-b:2′,3′-d]dithiophene dicarboxylic acid and dissolve it in 10ml dimethyl sulfoxide solution, and prepare 10 -3 mol L -1 The solution. Shake well in an airtight container to fully dissolve. Dilute the solution to make 10 -6 mol L -1 Put it into a 10ml brown volumetric flask to fully dissolve it evenly. Then, with a microsyringe, a concentration of 10 -6 mol L -1 The solution was dropped onto the newly cleaved mica substrate. Keep it in a closed and dry environment at a temperature of 25°C for 40 hours to dry naturally. Measured using the DFM mode of the atomic force microscope. A monolayer structure that can be arranged at a certain angle on the surface of a substrate, see figure 2 .
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com