Preparation method of inverse opal hydrogel photonic crystal with double layer hybridized structure
A hybrid structure, inverse opal technology, used in optics, nonlinear optics, instruments, etc., can solve problems such as limited application and fragility
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Embodiment 1
[0011] (1) Disperse the uniform monodisperse silica microspheres in ethanol to form a solution with a mass fraction of 4%, then pour the solution into a clean container, and finally insert the clean substrate vertically into the above-mentioned In a container containing a monodisperse silica microsphere ethanol solution, place it in a closed environment at room temperature for one week to deposit the silica microspheres on the surface of the substrate to form opal colloidal crystals. The substrate is a glass sheet or Silicon wafer; the diameter of the silica microspheres is 180nm;
[0012] (2) Immerse the vertical liquid surface of the substrate processed in step (1) in the polyacrylic acid monomer solution for 3 minutes. The concentration of the polyacrylic acid monomer solution is 5M, and the polyacrylic acid monomer solution contains 10% crosslinked agent N, N'-methylenebisacrylamide and 3% photoinitiator 1-hydroxycyclohexylbenzophenone, so that polyacrylic acid monomers ca...
Embodiment 2
[0015] (1) Disperse the uniform monodisperse silica microspheres in ethanol to form a solution with a mass fraction of 1%, then pour the solution into a clean container, and finally insert the clean substrate vertically into the above-mentioned In a container containing a monodisperse silica microsphere ethanol solution, place it in a closed environment at room temperature for one week to deposit the silica microspheres on the surface of the substrate to form opal colloidal crystals. The substrate is a glass sheet or Silicon wafer; the diameter of the silica microspheres is 232nm;
[0016] (2) Immerse the vertical liquid surface of the substrate processed in step (1) in the polyacrylic acid monomer solution for 3 minutes, the concentration of the polyacrylic acid monomer solution is 4M, and the polyacrylic acid monomer solution contains 5% crosslinked agent N, N'-methylenebisacrylamide and 3% photoinitiator 1-hydroxycyclohexylbenzophenone, so that polyacrylic acid monomers can...
Embodiment 3
[0019] (1) Disperse the uniform monodisperse silica microspheres in ethanol to form a solution with a mass fraction of 0.5%, then pour the solution into a clean container, and finally insert the clean substrate vertically into the above-mentioned In a container containing a monodisperse silica microsphere ethanol solution, place it in a closed environment at room temperature for one week to deposit the silica microspheres on the surface of the substrate to form opal colloidal crystals. The substrate is a glass sheet or Silicon wafer; the diameter of the silica microspheres is 300nm;
[0020] (2) Immerse the vertical liquid surface of the substrate processed in step (1) in the polyacrylic acid monomer solution for 3 minutes. The concentration of the polyacrylic acid monomer solution is 1M, and the polyacrylic acid monomer solution contains 1% crosslinked agent N, N'-methylenebisacrylamide and 3% photoinitiator 1-hydroxycyclohexylbenzophenone, so that polyacrylic acid monomers c...
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