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Photomask storage device and method for keeping photomask clean and dry

A storage device and photomask technology, which is used in photolithography process exposure devices, microlithography exposure equipment, and originals for optomechanical processing, etc., which can solve the problem that clean rooms cannot be absolutely dust-free.

Inactive Publication Date: 2010-03-17
GUDENG PRECISION IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the current clean room cannot achieve an absolutely dust-free state.

Method used

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  • Photomask storage device and method for keeping photomask clean and dry
  • Photomask storage device and method for keeping photomask clean and dry
  • Photomask storage device and method for keeping photomask clean and dry

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Embodiment Construction

[0038] Since the present invention discloses a photomask storage device and its method for keeping the photomask clean and dry, some of the detailed manufacturing or processing processes of the photomask or storage device used in it are achieved by using existing technologies, so In the following description, a full description is not given. Moreover, the drawings below are not completely drawn according to the actual relevant dimensions, and their function is only to express the schematic diagrams related to the features of the present invention.

[0039] see figure 1 , which is a schematic diagram of the appearance of the photomask storage device of the present invention. The storage device 1 has a first cover 11 and a second cover 12 , and the two covers are combined to form an inner space for placing a photomask.

[0040] see next figure 2 , which is a top view of the second cover of the photomask storage device of the present invention. In the second cover 12, there ...

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PUM

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Abstract

The invention relates to a photomask storage device and a method for keeping a photomask clean and dry. The photomask storage device capable of being filled with gas is used for storing at least one photomask, and the photomask is provided with a pattern surface; the pattern surface is provided with a protection piece; the storage device comprises a first cover body, a second cover body, at leastone fixing piece, at least one gas inlet port and at least one gas outlet port, wherein the second cover body is used for combining with the first cover body to form an inner space for accommodating the photomask, and the second cover body is provided with a central part; the at least one fixing piece is arranged on the second cover body and is used for supporting and positioning the photomask; the at least one gas inlet port is arranged on the second cover body and is arranged outside a projection area of the photomask; and the at least one gas outlet port is arranged on the other side of thesecond cover body which takes the central part as a center and is opposite to the inlet gas port. The gas entering from the gas inlet port passes through upper and lower surfaces of the photomask andtakes away moisture which is positioned on the photomask and is absorbed on the surface of the protection piece so as to reduce the humidity in the photomask storage device quickly.

Description

technical field [0001] The invention relates to a photomask storage device and a method for using the photomask storage device to keep a photomask clean and dry. Background technique [0002] The rapid development of modern semiconductor technology, in which lithography technology plays an important role, as long as it is about the definition of graphics, it needs to rely on lithography technology. In the application of photolithography technology in semiconductors, the designed circuit is made into a light-transmitting mask with a specific shape. Using the principle of exposure, the light source is projected onto the silicon wafer through the mask to expose and display specific patterns. Since any dust particles (such as particles, dust or organic matter) attached to the mask will cause the quality of projection imaging to deteriorate, the mask used to generate graphics must be kept absolutely clean. Therefore, in general wafer processes, dust-free Room environment to avo...

Claims

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Application Information

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IPC IPC(8): G03F1/00G03F7/20G03F1/66
Inventor 邱铭隆
Owner GUDENG PRECISION IND CO LTD
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