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Method for preparing trichlorosilane from tetrachlorosilane

A technology of silicon tetrachloride and trichlorosilane, which is applied in the direction of silicon halide compounds and halosilanes, can solve the problems of low utilization rate of silicon tetrachloride and low added value of products, and achieve the reduction of gas boundary layer and solve the problem of Environmental protection issues, the effect of large flow

Inactive Publication Date: 2010-05-05
LESHAN LEDIAN TIANWEI SILICON TECH CO LTD
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Problems solved by technology

[0007] Due to reasons such as low added value of products produced by transportation and production, this method has a low utilization rate of silicon tetrachloride, and this method has not been widely applied in polysilicon production enterprises.

Method used

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Embodiment Construction

[0018] The specific implementation of the present invention will be further described below in conjunction with the examples, and the present invention is not limited to the scope of the examples.

[0019] Embodiment Adopt the method of the present invention to produce trichlorosilane by silicon tetrachloride

[0020] Add silicon tetrachloride into the silicon tetrachloride gasification device, heat to obtain silicon tetrachloride gas, and at the same time, pass in hydrogen and control the pressure in the silicon tetrachloride gasification device to be 0.5-1.3Mpa, so that the molar ratio is 0.15 ~ 0.4:1 mixture of silicon tetrachloride and hydrogen. The speed of hydrogen passing into the silicon tetrachloride gasification device is 1100-1500Nm 3 / h, the rate at which silicon tetrachloride is fed into the silicon tetrachloride gasification device is 2300-3500 kg / h, and the rate at which hydrogen and silicon tetrachloride are fed into the silicon tetrachloride gasification devi...

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Abstract

The invention relates to a method for preparing trichlorosilane from tetrachlorosilane, belonging to the field of polysilicon production. The invention solves the technical problem of providing a method for preparing trichlorosilane from tetrachlorosilane with higher conversion rate. The method comprises the following step: introducing tetrachlorosilane and hydrogen with the molar ratio of 0.15-0.4:1 into a hydrogenation furnace with the pressure of 0.3-0.6Mpa for reaction. The method of the invention improves the conversion rate of the tetrachlorosilane (the conversion rate is improved to about 32%) and the conversion quantity in the same time, solves the problems of accumulation of a large amount of by-product tetrachlorosilane in the production process of polysilicon and environmental protection, has better economic benefit and wide application prospects, and provides a new choice for the processing method of tetrachlorosilane in the field.

Description

technical field [0001] The invention relates to a method for preparing trichlorosilane from silicon tetrachloride, belonging to the field of polysilicon production. Background technique [0002] The improved Siemens method is currently the mainstream method for producing polysilicon at home and abroad. This method uses the reduction of trichlorosilane to produce polysilicon. However, when polysilicon is produced by reduction of trichlorosilane, a large amount of by-product-silicon tetrachloride will be produced. Silicon tetrachloride is a highly corrosive, toxic and harmful liquid that must be disposed of to avoid polluting the environment. [0003] At present, the processing methods of polysilicon manufacturers for silicon tetrachloride mainly include the following: [0004] 1. Silicon tetrachloride is converted into trichlorosilane after hydrothermal hydrogenation [0005] The process is: heating silicon tetrachloride and hydrogen at about 1250°C under normal pressure t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 唐前正何劲赵新征卢涛彭卡李品贤
Owner LESHAN LEDIAN TIANWEI SILICON TECH CO LTD
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