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Material gas concentration control system

A material gas and control system technology, applied in the direction of control/regulation system, ratio control, non-electric variable control, etc., can solve the problems of over-limit measurement concentration, longer control time, longer stabilization time, etc., and achieve good responsiveness , good responsiveness, small time delay effect

Active Publication Date: 2013-06-12
HORIBA LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] Second, if Figure 8 As shown in the graph of , if the material liquid in the storage tank decreases and the volume of the gas increases, when the set concentration is changed, the control time (permanent time) it takes until the measured concentration reaches the same value will change. long
The reason can be considered that the total pressure in the storage tank changes due to the increase in the volume of the gas in the storage tank, resulting in an increase in the flow rate of the carrier gas necessary for the concentration to reach the desired value. The gas replacement time until the gas is replaced to the required gas concentration becomes longer
[0013] In other words, when the material liquid decreases, the system that has been the control object until then will change to a system that wastes more time. Therefore, when a step such as changing the set concentration is input, the measured concentration that is output Will greatly exceed the limit (overshoot), which will cause hunting (hunting), resulting in longer settling time
[0014] In addition, since the response speed of the concentration measuring unit decreases with changes in various measurement environments, there is also the problem that the settling time becomes longer as described above due to an increase in wasted time.
[0015] For this kind of problem, although it can also be considered to increase the flow rate of the carrier gas and shorten the gas replacement time to shorten the settling time, the flow rate or the total flow rate of the material gas will also change, so it cannot be kept at a constant flow rate
[0016] "Increase in wasted time due to increase in gas volume in the storage tank"
[0017] Third, in this type of control system, when the material liquid decreases and the volume of the gas in the storage tank increases, when changing the set concentration, the mixed gas in the storage tank is completely replaced with the new setting Concentration of gas is more time-consuming
However, this solution becomes a major cause of man-hours or new costs for installing the liquid meter in the tank

Method used

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Embodiment

[0080] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

no. 1 approach 》

[0082] The material gas concentration control system 100 of the present invention is, for example, used to stably supply the IPA (Isopropyl Alcohol, isopropanol) concentration in the dry processing storage tank 13 of the wafer cleaning device used in the semiconductor manufacturing process. More specifically, the material gas concentration control system 100 of the present invention is for vaporizing the IPA material liquid L and supplying it to the bubbling system 1 in the drying process storage tank 13 . In addition, the IPA material liquid L corresponds to the material in the claims, and the bubbling system 1 corresponds to the gasification system in the claims. Here, even if the material is a solid material, the present invention can obtain the same effect. In addition, the present invention is not limited to the concentration control of the material gas obtained by vaporizing the IPA material liquid L. For example, it can also be used for concentration control in a CVD (...

no. 2 approach 》

[0147] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. The composition of the second embodiment is the same as that of the first embodiment, such as figure 1 and figure 2 shown. Moreover, the actions related to concentration control are also the same as those in the first embodiment, such as image 3 and Figure 4 shown.

[0148] In the second embodiment, the operation and effect of the concentration control of the material gas in a state where the material liquid L is reduced will be described in detail. Figure 7 An example of the result when the concentration control of the material gas as described above is performed in a state where the material liquid L is reduced is shown. For a certain period of time after the set concentration is changed, the pressure in the storage tank at which the saturated vapor pressure of the material gas reaches the set concentration under the saturated vapor pressure of the material ...

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Abstract

A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

Description

technical field [0001] The present invention relates to a system for controlling the concentration of the vaporized material gas in a material vaporization system for introducing a carrier gas into a solid or liquid material stored in a storage tank to vaporize the material. Background technique [0002] As the concentration control system of the material gas in this kind of material gasification system, a system disclosed in Patent Documents 1 and 2 can be cited, which includes: a mass flow controller (massflow controller), which is arranged in the introduction tube for introducing the carrier gas ; a constant temperature tank, which is used to keep the storage tank storing the material liquid at a constant temperature; and a manometer (manometer), which is arranged in the outlet pipe for exporting the mixed gas of the material gas and the carrier gas, and is used to measure the pressure of the mixed gas, that is, Measure total pressure. [0003] The system keeps the mater...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/52
CPCG05D11/132Y10T137/2509Y10T137/0396Y10T137/2708Y10T137/2499C23C16/448C23C16/52H01L21/67242H01L21/67017
Inventor 南雅和林大介坂口有平西村克美井上正规泷尻兴太郎
Owner HORIBA LTD
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