Cambered artificial compound eye and preparation method thereof
An artificial and compound eye technology, which is applied in the field of curved surface artificial compound eyes and its preparation, can solve the problems of numerous process steps, large size change of the original compound eye lens, high equipment requirements and unfavorable preparation of curved surface compound eye optical system, etc., to increase the field of view , Improve the effect of edge imaging quality
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Embodiment 1
[0035] Such as Figure 1a and Figure 1d As shown, this embodiment includes: a fly eye base and a circular structure fly eye lens, wherein:
[0036] Such as Figure 1b As shown, the fly eye lens is a spherical convex lens with a diameter of 160 microns and a height of 16 microns.
[0037] Such as Figure 1c As shown, the diameter of the compound eye base is 2 cm;
[0038] The present embodiment is prepared through the following steps:
[0039] The first step is to clean the silicon wafer substrate, and sputter chromium on the silicon wafer substrate to make a thickness of 100? metal layer.
[0040] In the second step, the photoresist is spin-coated on the surface of the metal layer, and then a columnar convex structure is formed through photolithography; the mask plate is a circular compound eye array structure.
[0041] The cylinder has a diameter of 150 microns and a height of 18 microns.
[0042] The third step is to place the photoresist-coated silicon wafer substra...
Embodiment 2
[0051] Such as Figure 2a and Figure 2d As shown, this embodiment includes: a fly-eye base and a fly-eye lens with a hexagonal structure, wherein:
[0052] Such as Figure 2b As shown, the fly eye lens is a hexagonal convex lens with a diagonal length of 190 microns and a height of 19 microns;
[0053] Such as Figure 2c As shown, the diameter of the base of the compound eye is 1.8 cm.
[0054] The present embodiment is prepared through the following steps:
[0055] The first step is to clean the silicon wafer substrate, and sputter chromium on the silicon wafer substrate to make a thickness of 100? metal layer.
[0056]In the second step, the photoresist is spin-coated on the surface of the metal layer, and then a columnar convex structure is formed through photolithography; the mask plate is a hexagonal compound eye array structure.
[0057] The hexagonal pillars are 180 microns in diameter and 21 microns in height.
[0058] The third step is to place the photoresis...
Embodiment 3
[0067] Such as Figure 3a and Figure 3d As shown, this embodiment includes: a fly-eye base and a fly-eye lens with a square structure, wherein:
[0068] Such as Figure 3b As shown, the fly eye lens is a square convex lens with a side length of 180 microns and a height of 20 microns;
[0069] Such as Figure 3c As shown, the diameter of the base of the compound eye is 3 cm.
[0070] The present embodiment is prepared through the following steps:
[0071] The first step is to clean the silicon wafer substrate, and sputter chromium on the silicon wafer substrate to make a thickness of 100? metal layer.
[0072] In the second step, the photoresist is spin-coated on the surface of the metal layer, and then a columnar convex structure is formed through photolithography; the mask plate is a hexagonal compound eye array structure.
[0073] The square pillars are 175 microns in diameter and 22 microns in height.
[0074] The third step is to place the photoresist-coated silic...
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Abstract
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