Automatic horizontal silicon substrate film producing device
A silicon-based thin film and production device technology, applied in gaseous chemical plating, coating, metal material coating process, etc., can solve problems such as loss, non-alternative use, production process interruption, etc., and achieve fast heating speed and uniform heating , the effect of high flexibility
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[0026] The present invention will be further described below in conjunction with accompanying drawing:
[0027] An automatic horizontal silicon-based film production device is characterized in that it consists of a heating section, a vacuum transition section 1, a deposition section, a vacuum transition section 2, and a cooling section. Automatic gate valves are installed between the working chambers, and the heating section and The cooling section is a non-vacuum section.
[0028] In the present invention, the deposition section is composed of at least two deposition modules, and each deposition module is composed of a deposition chamber, a vacuum transition chamber, a transmission device, a position measuring device, a vacuum obtaining device, a gas distribution device and an exhaust device, and the deposition chamber is distributed in On both sides of the vacuum transition chamber, each deposition chamber is connected to a process dry pump. The deposition chamber and the va...
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