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Automatic horizontal silicon substrate film producing device

A silicon-based thin film and production device technology, applied in gaseous chemical plating, coating, metal material coating process, etc., can solve problems such as loss, non-alternative use, production process interruption, etc., and achieve fast heating speed and uniform heating , the effect of high flexibility

Active Publication Date: 2010-06-23
HANGZHOU BLUSR NEW MATERIALS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the traditional flat-plate fractional continuous coating device has a low degree of automation and integration. The positions of each process room are relatively fixed and cannot be used alternately. If a process room in the middle fails or needs maintenance, the entire production process will be interrupted.
And generally a set of equipment is only suitable for a fixed process system. Once the process system is adjusted, it may not be able to adapt to the new process system and be forced to eliminate it, causing huge losses.
The above problems have always existed in this industry, so far there is no good solution

Method used

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  • Automatic horizontal silicon substrate film producing device
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  • Automatic horizontal silicon substrate film producing device

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with accompanying drawing:

[0027] An automatic horizontal silicon-based film production device is characterized in that it consists of a heating section, a vacuum transition section 1, a deposition section, a vacuum transition section 2, and a cooling section. Automatic gate valves are installed between the working chambers, and the heating section and The cooling section is a non-vacuum section.

[0028] In the present invention, the deposition section is composed of at least two deposition modules, and each deposition module is composed of a deposition chamber, a vacuum transition chamber, a transmission device, a position measuring device, a vacuum obtaining device, a gas distribution device and an exhaust device, and the deposition chamber is distributed in On both sides of the vacuum transition chamber, each deposition chamber is connected to a process dry pump. The deposition chamber and the va...

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Abstract

The invention relates to the field of solar energy application, in particular to an automatic horizontal silicon substrate film producing device. The device comprises a heating section, a vacuum transition section 1, a depositing section, a vacuum transition section 2 and a cooling section. An automatic gate valve is arranged between the working rooms; the heating section and the cooling section are anti-vacuum sections; the depositing section comprises a plurality of depositing modules; each depositing module comprise a depositing chamber, a vacuum transition chamber, a driving device, a position measuring device, a vacuumizing device, a distributing device and a discharging device; two depositing chambers are symmetrically or asymmetrically distributed on two sides of the vacuum transition chamber; each depositing chamber is connected with one drying pump; the depositing chamber and the vacuum transition chamber share a set of vacuumizing device; two ends of the depositing module are provided with two connecting devices which have a same size and shape or match with each other; and a continuous coating film depositing section is formed by connecting a plurality of parallel depositing modules by the connecting device. The device can change the number of the depositing modules according to the film coating technique and different demands of capacity design, and has wide application range, high producing efficiency and convenient maintenance.

Description

Technical field: [0001] The invention relates to the application field of solar energy, in particular to an automatic horizontal silicon-based film PECVD production device which adopts a modular design and can be flexibly adjusted according to customer requirements. Background technique: [0002] As we all know, the increasingly serious energy crisis and environmental pollution have greatly promoted the rapid development of the photovoltaic industry. In the photovoltaic cell family, silicon-based thin-film cells are not limited by the shortage of silicon raw materials and have unique low-light power generation performance. More and more investors in the field of photovoltaics are turning their attention to the production of silicon-based thin-film cells. [0003] In the manufacturing process of silicon-based thin film batteries, the most important manufacturing equipment is the PECVD deposition equipment used to deposit silicon-based thin films. This equipment manufacturing ...

Claims

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Application Information

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IPC IPC(8): C23C16/24C23C16/54
Inventor 解欣业王伟史国华刘先平邓晶
Owner HANGZHOU BLUSR NEW MATERIALS TECH
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