Step-type multi-step silicon material cleaning equipment

A cleaning equipment and a step-by-step technology, applied to cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as environmental pollution and large water consumption, and achieve waste reduction, cleaning cost reduction, and energy saving water effect noticeable effect

Inactive Publication Date: 2010-07-14
EGING PHOTOVOLTAIC TECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing multi-level cleaning tank structure, each level of cleaning tank has an independent water inlet and outlet system, and each level has wastewater discharged. The sewage discharged from the cleaning tanks at each level is directly discharged, and

Method used

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  • Step-type multi-step silicon material cleaning equipment
  • Step-type multi-step silicon material cleaning equipment

Examples

Experimental program
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Example Embodiment

[0013] The stepped multi-stage silicon material cleaning equipment of the present invention is attached figure 1 As shown, it includes the frame 1, the primary cleaning tank 2, the transition cleaning tank 3, the final cleaning tank 4, the water inlet valve 5, the filtration treatment tank 6, the circulating pump 7, the partition screen 8 and the dirty liquid tank 9. The tank 9, the primary cleaning tank 2, the transition cleaning tank 3, and the last cleaning tank 4 are arranged on the frame 1 ascending from left to right. The water inlet valve 5 is connected to the last cleaning tank 4, and the last cleaning tank 4 is connected to the transition The side wall of the cleaning tank 3 is provided with a backflow hole 10, and the backflow hole 10 is connected to the filtering treatment tank 6 through a hose 13; a partition screen 8 is provided in the transition cleaning tank 3, and the partition screen 8 will clean the transition The tank 3 is divided into a cleaning chamber 11 a...

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Abstract

The invention relates to step-type multi-step silicon material cleaning equipment. The step-type multi-step silicon material cleaning equipment comprises primary cleaning tanks, transitional cleaning tanks, a final cleaning tank, a water inlet valve, a filtration treating pond, a circulating pump, a separation bank and a foul solution tank, wherein each primary cleaning tank and transitional cleaning tank are provided with a separation net-like plate respectively; each cleaning tank is divided into a cleaning chamber and a foul solution overflowing chamber by the separation net-like plate; the cleaning solution flowing from the next cleaning tank flows into the previous cleaning tank to be used for supplementing the cleaning solution; sewage floating on the upper surface of the foul solution overflowing chamber flows into a filtrate treating pond through a hose to perform secondary treatment; and the processed cleaning liquid is pumped to the primary cleaning tanks by the circulating pump to be used as the cleaning solution of the primary cleaning tanks. The actual use of the applicant proves that the step-type multi-step silicon material cleaning equipment has the advantages that: the water consumption for cleaning one ton of silicon wafer is three tons and is reduced by more than five tons compared with that of the conventional cleaner, water-saving effect is very obvious and the water waste caused by independent water use of the cleaning tanks is avoided.

Description

Technical field: [0001] The invention relates to silicon material cleaning equipment. Background technique: [0002] In solar photovoltaic production enterprises, the silicon material used for drawing silicon rods must be cleaned in multiple stages to remove the oil, dust and other attachments attached to the surface of the silicon material, so as to improve the purity of the silicon rods. Currently, the cleaning equipment used is a multi-stage tank The cleaning machine usually contains three or more cleaning tanks. The silicon material to be cleaned is removed step by step from the first cleaning tank. In the primary cleaning tank, the impurities attached to the surface of the silicon wafer are the most, and will gradually decrease in the future. In the existing multi-level cleaning tank structure, each level of cleaning tank has an independent water inlet and outlet system, and each level has wastewater discharged. The sewage discharged from the cleaning tanks at each leve...

Claims

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Application Information

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IPC IPC(8): B08B3/04B08B3/12B08B3/10
Inventor 蒋新民
Owner EGING PHOTOVOLTAIC TECHNOLOGY CO LTD
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