Pixel structure and manufacturing method thereof and manufacturing method of electronic device
A technology of pixel structure and manufacturing method, which is applied in the manufacture of electronic devices, pixel structure and its manufacturing field, can solve problems such as pixel structure degradation, and achieve the effect of solving degradation problems and good component characteristics
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[0036] figure 1 It is a schematic cross-sectional view of a pixel structure according to an embodiment of the present invention. Please refer to figure 1 The pixel structure 100 includes a substrate 102 , a gate 112 , an insulating layer 120 , a metal oxide semiconductor layer 130 , a source 134 and a drain 136 , a first protection layer 140 and a first electrode layer 162 . Wherein, the gate 112 , the metal oxide semiconductor layer 130 , the source 134 and the drain 136 constitute the active device 110 . In detail, the gate 112 is located on the substrate 102 . The insulating layer 120 covers the gate 112 . The metal oxide semiconductor layer 130 is on the insulating layer 120 above the gate 112 . The source 134 and the drain 136 are located on the metal oxide semiconductor layer 130 . The first passivation layer 140 is located on the source electrode 134 and the drain electrode 136 and covers the metal oxide semiconductor layer 130 . In this embodiment, the metal oxid...
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