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Method for testing physical performances of film and film-substrate interface based on nanometer indentation continuous stiffness curve

A technology of physical properties and nano-indentation, applied in the direction of mechanical thickness measurement, testing material hardness, etc., to achieve a wide range of applications, the effect of a wide range of applications

Inactive Publication Date: 2010-08-18
CHINA UNIV OF GEOSCIENCES (BEIJING)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The hardness and elastic modulus of the film are measured with a nano-indentation instrument, and the maximum indentation depth can only be avoided within one-tenth of the film thickness to avoid being affected by the properties of the matrix (D.Beegan, M.T.Laugier, Surf.Coatings Technol. 199(2005) 32.), there is no mature method that can separate the above physical properties of the film when the maximum indentation depth is large

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  • Method for testing physical performances of film and film-substrate interface based on nanometer indentation continuous stiffness curve
  • Method for testing physical performances of film and film-substrate interface based on nanometer indentation continuous stiffness curve
  • Method for testing physical performances of film and film-substrate interface based on nanometer indentation continuous stiffness curve

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Embodiment 1: The tested sample is a glass-based titanium film, and the samples used for calibration are glass-based titanium films with a film thickness of 750nm and a film thickness of 2100nm, see Table (1). The sample used to test the thickness is a sample with a film thickness of 1400nm. It is assumed that the known thickness samples are glass-based titanium films with a film thickness of 750nm and a film thickness of 2100nm. These two film thicknesses are randomly selected. The titanium film with a film thickness of 1400nm is the sample to be tested, and the film thickness is assumed to be unknown. The glass is all commercial white float glass. Titanium films were prepared by magnetron sputtering. Use the following methods to analyze and test relevant physical properties:

[0021] (1) Do nanoindentation experiments on solid film samples, choose the continuous stiffness method, and repeat three times for each sample;

[0022] (2) Obtain the relationship curve of ...

Embodiment 2

[0029] Embodiment 2: The sample to be tested is a glass-based titanium nitride film, and the samples used for calibration are glass-based titanium nitride with a film thickness of 110 nm and a film thickness of 320 nm. The sample used to test the thickness is a sample with a film thickness of 185nm. It is assumed that the known thickness samples are 110nm film thickness and 320nm film thickness, these two film thicknesses are randomly selected, and the 185nm sample is the tested sample, assuming that the film thickness is unknown. The glass is all commercial white float glass. Titanium nitride films were prepared by magnetron sputtering. The operation steps are the same as those in Example 1, see Table (3) for obtaining a and b, and see Table (2) for the film thickness obtained by testing.

Embodiment 3

[0030] Example 3: The tested samples are glass-based titanium films, and the film thicknesses are 310nm, 440nm, 750nm, 930nm, 1160nm, 1400nm, 2100nm, see Table (1). The glass is all commercial white float glass. Titanium films were prepared by magnetron sputtering. Use the following methods to analyze and test relevant physical properties:

[0031] (1) Do nanoindentation experiments on solid film samples, choose the continuous stiffness method, and repeat three times for each sample;

[0032] (2) Obtain the relationship curve of the hardness and elastic modulus of the material with the indentation depth through the loading curve;

[0033] (3) will E r 2 / H is used as the ordinate, and the indentation depth h is used as the abscissa, and the fitting is carried out by formula (1), and the fitting range is 20nm to 2400nm;

[0034] (4) Process the original data according to the iterative screening least squares method: after the first fitting, the trend line is used as the st...

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Abstract

The invention relates to a a method for testing physical performances of a solid film and a film-substrate interface and belongs to the technical fields of analytic instruments and material performance testing. The method is based on a nanometer indentation continuous stiffness curve and takes the ratio of elastic modulus square of a film-substrate system to the hardness as the ordinate and the indentation depth as the abscissa, a curve is fitted in a iteration screening least square method, and fitted parameters are analyzed and demarcated, thus measuring the physical performances of the film which includes the thickness and the ratio of the elastic modulus square to the hardness and representing parameters related to the thickness of an interface layer and parameters related to the ratio of the elastic modulus square of the interface layer to the hardness and the like. In the method, all tests of the physical performances of the film and the film-substrate interface are based on the nanometer indentation technology, the method can be carried out under the condition of not exposing the substrate surface, the existing equipment does not need to be altered, only the analytic method needs to be change, the application range is wide, and any film material with the film thickness less than the maximum indentation depth of a nanometer indenter can use the method.

Description

technical field [0001] The invention relates to a method for testing the physical properties of the interface between a thin film and a film base based on a nano-indentation continuous stiffness curve, and belongs to the technical field of analytical instruments and material performance testing thereof. Background technique [0002] Thin film technology is widely used in today's industrial products, that is, a thin film is coated on the surface of the product to prevent material corrosion, oxidation, etc. to improve the durability of the material, or to increase the material's function by giving the material different properties from the substrate, or Make the material more beautiful etc. In many applications, the physical properties of the film (such as thickness, elastic modulus, hardness, etc.) and the nature of the interaction between the film and the substrate have a considerable impact on the quality of the product and need to be defined. [0003] For the measurement ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N3/42G01B5/06
Inventor 温涛彭志坚龚江宏王成彪付志强于翔岳文
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
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