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Lithographic apparatus and device manufacturing method

A lithography equipment and construction technology, applied in microlithography exposure equipment, optomechanical equipment, mechanical equipment, etc., can solve the problems of complex control strategy, influence of precise positioning of substrate table, deformation or displacement of substrate table, etc.

Active Publication Date: 2010-09-22
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It has been found that the arrangement of the actuator assembly can lead to unwanted deformation or displacement of the substrate table during operation of the positioning device, thereby negatively affecting the precise positioning of the substrate table
To avoid such unwanted deformations or displacements, complex control strategies or additional actuators are required

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
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Embodiment Construction

[0023] figure 1A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., ultraviolet (UV) radiation or any other suitable radiation); a patterning device support structure or support structure (e.g., mask A mold table) MT configured to support a patterning device (eg mask) MA and connected to a first positioning device PM configured to precisely position the patterning device according to determined parameters. The apparatus also includes a substrate table (e.g., wafer table) WT or "substrate support structure" configured to hold a substrate (e.g., a resist-coated wafer) W and configured to be precisely positioned according to certain parameters. The second positioner PW of the substrate is connected. The apparatus also includes a projection system (e.g. a refractive projection lens system) PS configured to project...

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Abstract

A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.

Description

technical field [0001] The invention relates to a photolithographic equipment and a positioning component. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred via imaging onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of successively patterned adjacent target portions. Known lithographic apparatuses include so-called steppers, in which each...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70758G03F7/70783Y10T74/20354G03F7/70716G03F7/70725G03F7/70775
Inventor M·J·沃奥尔戴尔冬克R·C·昆斯特Y·K·M·德沃斯J·H·A·范德瑞吉德特R·J·T·范克姆彭
Owner ASML NETHERLANDS BV
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