Photoelectric conversion device and manufacture method thereof
A technology for a photoelectric conversion device and a manufacturing method, which is applied in photovoltaic power generation, circuits, electrical components, etc., can solve problems such as the adverse effect of photoelectric conversion efficiency, the large resistance value of materials, and the failure to effectively improve the conversion efficiency.
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Embodiment 1
[0039] See Figure 2A to Figure 2C , to create a flow chart for the photoelectric conversion device of this embodiment. First, if Figure 2A As shown, the second semiconductor layer 22 is formed on the first semiconductor layer 21. In this embodiment, the first semiconductor layer 21 is a P-type doped silicon layer, while the second semiconductor layer 22 is an N-type doped silicon layer. silicon layer.
[0040] Next, if Figure 2B As shown, the first electrode layer 23 is formed on the first semiconductor 21, and the second electrode layer 24 is formed on the second semiconductor 22, wherein the second electrode layer 24 has an opening region 241 to expose the second semiconductor layer 22 . In this embodiment, the second electrode layer 24 is as follows Figure 1A and 1B As shown in the interdigital shape, moreover, the first electrode layer 23 in contact with the first semiconductor layer 21 can use a high-power functional material to form an Ohmic contact; the second ...
Embodiment 2
[0044] The photoelectric conversion device of this embodiment is substantially the same as that of Embodiment 1, except that the low-reflection conductive film 25 of this embodiment is a silver film.
Embodiment 3
[0046] The photoelectric conversion device of this embodiment is substantially the same as that of Embodiment 1, except that the low-reflection conductive film 25 of this embodiment is an aluminum film.
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