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Anti-reflection high-transmittance coated solar super-white embossed glass and manufacturing method thereof

A technology of ultra-clear embossed glass and high transmittance, applied in the field of ultra-clear embossed glass, can solve the problems of low effective light transmittance, affecting the power of solar power generation components, etc.

Active Publication Date: 2013-02-13
FLAT GLASS GROUP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In addition, the light reflection of general ultra-clear embossed glass is stronger at 10%, and the transmittance of effective light is lower. Therefore, it affects the power of solar power generation components.

Method used

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  • Anti-reflection high-transmittance coated solar super-white embossed glass and manufacturing method thereof
  • Anti-reflection high-transmittance coated solar super-white embossed glass and manufacturing method thereof
  • Anti-reflection high-transmittance coated solar super-white embossed glass and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] An antireflection and high transmittance coated solar ultra-clear embossed glass, the composition of the weight percentage of each component of the glass base layer is:

[0059] SiO 2 72.50%

[0060] al 2 o 3 2.50%

[0061] Fe 2 o 3 0.01%

[0062] CaO 11.00%

[0063] R 2 O 13.50%

[0064] Sb 2 o 3 0.39%

[0065] CeO 2 0.10%

[0066] The formation process of the coating layer on the glass substrate is as follows:

[0067] (1) Preparation of coating nanomaterials;

[0068] Form the weight percent of each component of coating film layer is:

[0069] {(CH 3 ) 2 CHOH} 68%;

[0070] (H 2 O) 7%;

[0071] (C 2 h 6 o 2 ) 10%;

[0072] SiO 2 15%

[0073] with SiO 2 As a precursor, the temperature and time of the alcohol reduction process control the reduction reaction cooling and reflux speed to obtain the porous nanomaterial SiO that needs to survive 2 ; After the colloid is obtained, it is diluted with alcohol to co...

Embodiment 2

[0078] An antireflection and high transmittance coated solar ultra-clear embossed glass, the composition of the weight percentage of each component of the glass base layer is:

[0079] SiO 2 73.50%

[0080] al 2 o 3 0.50%

[0081] Fe 2 o 3 0.006%

[0082] CaO 8.00%

[0083] MgO 4.00%

[0084] R 2 O 13.50%

[0085] Sb 2 o 3 0.10%

[0086] CeO 2 0.394%

[0087] The formation process of the coating layer on the glass substrate is as follows:

[0088] (1) Preparation of coating nanomaterials;

[0089] Form the weight percent of each component of coating film layer is:

[0090] {(CH 3 ) 2 CHOH} 77%;

[0091] (H 2 O) 5%;

[0092] (C 2 h 6 o 2 ) 8%;

[0093] SiO 2 10%

[0094] with SiO 2 As a precursor, the temperature and time of the alcohol reduction process control the reduction reaction cooling and reflux speed to obtain the porous nanomaterial SiO that needs to survive 2 ; After the colloid is obtained, it is...

Embodiment 3

[0099] An antireflection and high transmittance coated solar ultra-clear embossed glass, the composition of the weight percentage of each component of the glass base layer is:

[0100] SiO 2 74.00%

[0101] al 2 o 3 0.50%

[0102] Fe 2 o 3 0.006%

[0103] CaO 10.194%

[0104] R 2 O 14.50%

[0105] Sb 2 o 3 0.40%

[0106] CeO 2 0.40%

[0107] The formation process of the coating layer on the glass substrate is as follows:

[0108] (1) Preparation of coating nanomaterials;

[0109] Form the weight percent of each component of coating film layer is:

[0110] {(CH 3 ) 2 CHOH} 70%;

[0111] (H 2 O) 6%;

[0112] (C 2 h 6 o 2 ) 9%;

[0113] SiO 2 15%

[0114] with SiO 2 As a precursor, the temperature and time of the alcohol reduction process control the reduction reaction cooling and reflux speed to obtain the porous nanomaterial SiO that needs to survive 2 ; After the colloid is obtained, it is diluted with alcoh...

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Abstract

The invention relates to anti-reflection high-transmittance coated solar super-white embossed glass and a manufacturing method thereof. The glass comprises a glass base layer and a coating layer. The manufacturing method comprises the following steps of: selection of raw materials, proportioning, mixing, melting, calendaring, annealing, sheet collection with specified size, deep processing of appearance, coating processing and toughening. The reflected rays of the glass are reduced; and the glass is treated by double-sided coating technology so as to improve the effective sunlight section transmittance of the glass and fulfill the purposes of controlling the crystalline silicon used by a photovoltaic assembly to be relative reduced and improving the power of a solar power generation assembly.

Description

technical field [0001] The ultra-clear embossed glass matched with crystalline silicon cells and amorphous silicon electrode plates used in the solar photovoltaic cell module of the present invention is particularly an anti-reflection and high-transmittance coated solar ultra-clear embossed glass and a manufacturing method thereof. Background technique [0002] With the advancement of solar energy utilization and technology, the crystalline silicon adhesive film EVA used in photovoltaic modules is prone to aging under ultraviolet radiation, reducing adhesion and light transmittance, and shortening its service life. Due to the decrease in the output of crystalline silicon, the high price restricts the development of the solar energy utilization market to a large extent. In order to reduce the cost, many scientific research institutes have used amorphous silicon instead of crystalline silicon as the carrier of photovoltaic cells as the battery board, and it only needs 1 / 3 of t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C3/095C03C17/28C03C17/23
Inventor 阮洪良徐善凡
Owner FLAT GLASS GROUP CO LTD
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