Process of antireflection coating battery capable of reducing surface recombination

Abstract

The invention relates to a solar battery structure and the technical filed of manufacturing process, in particular to the process of an antireflection coating battery capable of reducing surface recombination. The process comprises the following processing steps: a, carrying out diffusion treatment on a silicon wafer; b, carrying out PSG removal and edge engraving on the silicon wafer; c, carrying out antireflection and / or passivation treatment on the surface of the silicon wafer; d, carrying out RIE fine hair making on the surface of the silicon wafer after antireflection and / or passivation treatment; and e, finally carrying out screen printing, and sintering to obtain the finished product. In the invention, the traditional battery structure is changed by changing the steps of the traditional battery process flow, fine hair making is carried out on an ARC (antireflection coating surface) rather than the surface of the silicon wafer, thus identical surface light limit effect can be achieved after fine hair making, and meanwhile, etching damage can not be caused on the surface of the silicon wafer, so as to achieve the object of improving battery efficiency.

Description

technical field [0001] The invention relates to the technical field of solar cell structure and manufacturing technology, in particular to a technology for reducing the surface of a composite anti-reflection film battery. Background technique [0002] The RIE texturing process (plasma reaction etching) will be introduced in the development of crystalline silicon solar energy technology. Compared with the commonly used chemical liquid corrosion texturing, it can increase its light absorption. Generally, the reflectivity after texturing can be controlled below 10%, ARC The rear reflectivity can be controlled below 4%, but at the same time, it will increase the surface damage of the silicon wafer and intensify its surface recombination, thereby reducing the Voc and Isc performance of the battery. Therefore, in the process, the treatment before ARC coating is generally handled well, and the anti-reflection adjustment of the ARC (surface anti-reflection coating) on ​​the front of...

AI Technical Summary

Problems solved by technology

[0003] The traditional battery manufacturing process is: silicon wafer-RIE texturing-diffusion-removing PSG+cutting-surface anti-reflective coating treatment-screen printing-sintering. Generally, silicon wafers are directly textured to increase broad absorption. Under the theory of chemical corrosion, the method will not cause texturing damage to the surface of the battery; however, RIE texturing uses the principle of dry etching, and its process will cause etching damage on the surface of the silicon wafer. Due to the existence of the damaged layer, it will cause Degradation of battery performance

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