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Dustproof thin film assembly accepting container

A technology of dust-proof film components and storage containers, which is applied in the direction of instruments, electrical components, and originals for photomechanical processing, etc., which can solve the problems that the vibration and impact of the dust-proof film component frame cannot be fully absorbed, and save cleaning work , reduce manufacturing costs, and use high-value effects

Active Publication Date: 2013-01-23
SHIN ETSU CHEM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the pellicle frame support body is very soft, the pellicle frame support body cannot be reliably and fully fixed on the pellicle assembly storage container by tools such as fixing bolts. When the body is very hard, it may not be able to sufficiently absorb the vibration, impact, etc.

Method used

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  • Dustproof thin film assembly accepting container
  • Dustproof thin film assembly accepting container
  • Dustproof thin film assembly accepting container

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] made as image 3 The pellicle assembly 1 is shown. That is, a 5000 series aluminum alloy is cut into a pellicle frame 11 with a long side external dimension of 1600mm, a short side external dimension of 1500mm, a height of 5.8mm, and a width of 13mm by machining, and black alumite is applied to the surface. deal with. Non-through holes 11 a into which pins 41 of the holding mechanism 4 can be inserted are provided at four predetermined positions on the outer surface of the pellicle frame 11 . The pellicle frame was washed with pure water, and after drying, a silicone adhesive diluted with toluene (manufactured by Shin-Etsu Chemical Co., Ltd., product name: X) was applied with a vertical 3-axis dispenser. -40-3122) as the adhesive layer 13. In addition, the cross-sectional shape of the pressure-sensitive adhesive layer 13 was a semicircle with a width of 4 mm and a height of 1.5 mm. At this time, the width of the pellicle frame was 13 mm, and since the adhesive layer...

Embodiment 2

[0080] Polycarbonate is used for the base part of the pellicle frame support body, and silicone rubber is used for the buffer part (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KE-1950-10, hardness: 10 measured with a rubber hardness tester TYPEA), Shaped by profile molding, except for this, the pellicle storage container was made in the same manner as in Example 1, and the pellicle was fixed and stored.

Embodiment 3

[0082] ABS is used for the base part of the pellicle frame support body, and PS-(PE / PP / PB) copolymer (manufactured by KURARAY PLASTICS Co., Ltd., product name: Septon KC-623, hardness: TYPE rubber hardness tester is used for the cushioning part) The measurement of A is 80), and it is shaped by profile molding. In addition, the dust-proof film assembly storage container is made in the same manner as in Example 1, and the dust-proof film assembly is fixed and stored.

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Abstract

The present invention is a dustproof thin film assembly accepting container, including: a tray configured to load a dustproof thin film assembly; and a cover part configured to cover the tray to form a closing space for accepting the dustproof thin film assembly. The tray includes: a dustproof thin film assembly frame support, only contacted with a section of an adhesive coating end face without adhesive arranged on a dustproof thin film assembly frame so as to support the dustproof thin film assembly; and a holding mechanism, fixing the dustproof thin film assembly frame on the dustproof thin film assembly frame support. The dustproof thin film assembly frame support is composed of a basal body part and a buffering part contacted with the dustproof thin film assembly frame, to form a conjugant formed by joining two components with different hardness. By means of the invention, the dustproof thin film assembly is fixed in the accepting container in a mode that an adhesive layer will not be contacted with the accepting container, thus, the adhesive layer can be protected even though a separation part is not used, thereby, the separation part does not need in an storage operation.

Description

technical field [0001] The present invention relates to a storage container for a pellicle used in the manufacture of semiconductor devices, printed circuit boards, liquid crystal displays and the like, in particular to a large pellicle container used in the manufacture of liquid crystal displays. Background technique [0002] In the manufacturing process of semiconductors such as LSI and super LSI or liquid crystal displays, semiconductor wafers or original plates for liquid crystals are irradiated with light to make patterns. However, if the photomask or shrink mask (hereinafter referred to as If there is dust attached to the photomask), the dust will absorb light or bend light, so in addition to deforming the transferred pattern and roughening the edges, it will also make the base black and damage the size, quality, appearance, etc. . [0003] Therefore, these operations are usually carried out in a clean room, but even so it is still quite difficult to keep the mask cle...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/66B65D81/107B65D85/86G03F1/62H01L21/027
CPCG03F1/62G03F1/82H01L21/02104H01L21/0274
Inventor 堀越淳
Owner SHIN ETSU CHEM IND CO LTD
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