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Damascene write poles produced via full film plating

一种写入极、晶片的技术，应用在只涂一磁性层支承的一部分涂层、数据记录、仪器等方向，能够解决很差极完整性和完成、器件故障等问题

Inactive Publication Date: 2011-03-30
WESTERN DIGITAL (FREMONT LLC)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Any photoresist residue can lead to poor pole integrity and finish, and even device failure

Method used

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  • Damascene write poles produced via full film plating
  • Damascene write poles produced via full film plating
  • Damascene write poles produced via full film plating

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Embodiment Construction

[0020] In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some of these specific details. In other instances, well-known structures and techniques have not been shown in detail to avoid unnecessarily obscuring the present invention.

[0021] Figure 2A-2I Illustrating a structure formed after various steps in the formation of a write pole according to one aspect of the disclosed subject matter. as reference Figure 2A It can be seen that the patterned mask 203 of tantalum (Ta) or the like is set on aluminum oxide (Al 2 o 3 ) on a substrate 202 disposed on a lower substrate 201 of chromium (Cr) or the like. The patterned mask 203 has openings 204 on the areas of the substrate 202 where the damascene trenches will be formed. by making Figure 2A The structure is subject...

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PUM

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Abstract

The invention relates to a damascene write poles produced via full film plating. A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.

Description

technical field [0001] The present invention relates generally to hard disk drives, and in particular to the production of damascene (damascene) write poles through full film plating. Background technique [0002] A hard disk drive includes one or more hard disks coated with a magnetic recording medium capable of storing data thereon. Hard drives also include read / write heads for interacting with data in the magnetic recording media. The write head includes an inductive element for generating a magnetic field that aligns the magnetic moments of domains in the magnetic recording medium to represent data bits. [0003] Magnetic recording techniques include longitudinal and perpendicular recording. Perpendicular magnetic recording (PMR) is a form of magnetic recording in which the magnetic moments representing the data bits are oriented perpendicular to the surface of the magnetic recording medium, as opposed to longitudinally along its magnetic tracks. PMR has many advantag...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/127
CPCG11B5/855Y10T29/49048
Inventor R·周M·蒋X·项J·王G·罗Y·李
Owner WESTERN DIGITAL (FREMONT LLC)