Unlock instant, AI-driven research and patent intelligence for your innovation.

Diffraction elements for alignment targets

A diffractive element and pre-alignment technology, applied in the field of diffractive elements, can solve the problems of weak alignment signal, insufficient reticle alignment accuracy, etc.

Inactive Publication Date: 2011-04-06
ASML HLDG NV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, conventional alignment targets produce weak alignment signals, resulting in insufficient reticle alignment accuracy

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Diffraction elements for alignment targets
  • Diffraction elements for alignment targets
  • Diffraction elements for alignment targets

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] This specification discloses one or more embodiments that incorporate or incorporate the features of this invention. The disclosed embodiments are merely exemplary of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the claims appended hereto.

[0025] The described embodiments and references in the specification to "one embodiment", "an embodiment", "exemplary embodiment" and the like mean that the described embodiments may include particular features, structures or characteristics, however, each embodiment The specific features, structures or characteristics may not necessarily be included. Also, these paragraphs are not necessarily referring to the same embodiment. Furthermore, when particular features, structures or characteristics are described in conjunction with an embodiment, it is to be understood that it is within the purview of those skilled in the art to implement that feature, structure or...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
depthaaaaaaaaaa
Login to View More

Abstract

A patterning device, including alignment targets having alignment features formed from a plurality of diffiractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.

Description

technical field [0001] The invention relates to a diffractive element for aligning a target. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a desired portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. [0003] Photolithography is widely regarded as one of the key steps...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00
CPCG03F9/7011G03F9/7076G03F9/7015H01L21/0275
Inventor Y·乌拉迪米尔斯基M·阿力夫R·A·萨拉尔德森
Owner ASML HLDG NV