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Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

A technique of workpiece, compensation value, applied in the direction of using optical devices, originals for photomechanical processing, photolithographic process exposure devices, etc., can solve problems such as not generally accepted standards, etc.

Active Publication Date: 2011-04-27
MICRONIC LASER SYST AB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, it is not yet a universally accepted standard

Method used

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  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

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Embodiment Construction

[0046] The following description is made with reference to the accompanying drawings. The description of the exemplary embodiments is to illustrate the invention, not to limit the scope of the invention.

[0047] It is to be noted that the method of the present invention is described in terms of a process depicted as a flowchart or flow diagram. Although a flow chart or flow diagram may describe operations as a sequential process, these operations may be performed in parallel, concurrently, or synchronously. Also, the order of operations can be rearranged. A process flow may end when its operations are complete, but may have additional steps (eg, repetitions) not included in the figure. The processing flow may correspond to a method, a function, a procedure, a subroutine, a subprogram, and the like. When the processing flow corresponds to a function, its end may correspond to the return of the function to the calling function or the main function.

[0048] Furthermore, the...

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PUM

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Abstract

Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Provisional Application No. 61 / 071,871, filed May 22, 2008, the entire contents of which are hereby incorporated by reference. [0003] This application also claims Attorney Docket Nos. 2674-000056 / US / 01 and P00326US, filed May 22, 2009, of Mikael Wahlsten and Fredrik Priority of U.S. Application No. __________ of , the entire contents of which are hereby incorporated by reference. technical field [0004] Exemplary embodiments relate to methods of manufacturing photomasks, templates, substrates, devices, or other workpieces that rely on performing multiple exposure and / or patterning steps on the same workpiece. More specifically, the exemplary embodiments provide methods and apparatus for improving alignment between multiple patterning steps by addressing deformation of the workpiece between the patterning steps. Background technique [0005] Fabrication of a phase shift photo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/30B41J2/435G01B11/25G03F7/20
CPCG03F9/7003G03F1/26G03F1/144G03F7/70466G03F1/42B41J2/435G01B11/25G01B11/30G03F7/20
Inventor 肖斯特罗姆·弗雷德里克米凯尔·瓦尔斯滕
Owner MICRONIC LASER SYST AB
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