Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

A technology for workpieces and compensation values, applied in the direction of using optical devices, originals for photomechanical processing, exposure devices for photographic plate-making processes, etc.

Active Publication Date: 2014-01-22
MICRONIC LASER SYST AB
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is not yet a universally accepted standard

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
  • Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The following description is made with reference to the accompanying drawings. The description of the exemplary embodiments is to illustrate the invention, not to limit the scope of the invention.

[0048] It is to be noted that the method of the present invention is described in terms of a process depicted as a flowchart or flow diagram. Although a flow chart or flow diagram may describe operations as a sequential process, these operations may be performed in parallel, concurrently, or synchronously. Also, the order of operations can be rearranged. A process flow may end when its operations are complete, but may have additional steps (eg, repetitions) not included in the figure. The processing flow may correspond to a method, a function, a procedure, a subroutine, a subprogram, and the like. When the processing flow corresponds to a function, its end may correspond to the return of the function to the calling function or the main function.

[0049] Furthermore, the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Provisional Application No. 61 / 071,871, filed May 22, 2008, the entire contents of which are hereby incorporated by reference. [0003] This application also claims Attorney Docket Nos. 2674-000056 / US / 01 and P00326US, filed May 22, 2009, of Mikael Wahlsten and Fredrik priority of U.S. Application No. 12 / 453,837, the entire contents of which are hereby incorporated by reference. [0004] Exemplary embodiments relate to methods of manufacturing photomasks, templates, substrates, devices, or other workpieces that rely on performing multiple exposure and / or patterning steps on the same workpiece. More specifically, the exemplary embodiments provide methods and apparatus for improving alignment between multiple patterning steps by addressing deformation of the workpiece between the patterning steps. Background technique [0005] Fabrication of a phase shift photomask (PSM) is an exem...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/30B41J2/435G01B11/25G03F7/20
CPCG03F9/7003G03F1/144G03F7/70466G03F1/26G03F1/42B41J2/435G01B11/25G01B11/30G03F7/20
Inventor 肖斯特罗姆·弗雷德里克米凯尔·瓦尔斯滕
Owner MICRONIC LASER SYST AB
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com