Grounding/supporting device and plasma treatment equipment employing same
A support device and processing equipment technology, which is applied in the field of microelectronics, can solve the problems of carrier board level drop, uneven support and grounding, uneven charge distribution, etc., and achieve uniform support, uniform charge distribution, and good processing quality.
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[0034] In order for those skilled in the art to better understand the technical solution of the present invention, the supporting device provided by the present invention and the plasma processing equipment using the supporting device will be described in detail below with reference to the accompanying drawings.
[0035]The support device provided by the present invention includes a rigid support column, a conductive carrier board contact part and an elastic component. Among them, the rigid support column is the main part of the support device; the carrier plate contact part is located at the top of the support column, and is used to support the carrier plate in the plasma processing equipment and make it electrically grounded; Variations occur in the elastic range and cause the overall height of the support means to vary. In practical applications, in order to ensure that the above-mentioned support device maintains good stability in high-temperature processes, the elastic co...
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