Method for eliminating oblique error caused by surface shape of elongated lens

Abstract

The invention discloses a method for eliminating an oblique error caused by a surface shape of an elongated lens, which comprises the following steps of: uploading a base, keeping the coordinate of a work piece table Y direction from changing, controlling the work piece table by an interferometer to move to different positions along an X direction, after focusing and leveling, reading oblique values at different positions by the interferometer, and calculating the oblique values at different positions caused by Y direction surface shape of the elongated lens; keeping the coordinate of a work piece table Y direction from changing, controlling the work piece table by the interferometer to move to different positions along the X direction, after focusing and leveling, reading oblique values at different positions by the interferometer, and calculating the oblique values at different positions caused by X direction surface shape of the elongated lens; and at a corresponding position of the work piece table, compensating the oblique value caused by the Y direction surface shape and the X direction surface shape of the elongated lens when the work piece table is controlled by the interferometer to be oblique. The method is simple and can eliminate the oblique error caused by the surface shape of the elongated lens.

Description

technical field [0001] The invention relates to a method for testing and correcting tilt errors caused by surface irregularities in an optical projection device, in particular to a method for eliminating tilt errors caused by long mirror surfaces. Background technique [0002] With the improvement of the integration of semiconductor integrated circuits, the feature size of integrated circuits is getting smaller and smaller, and the feature size of integrated circuits will ultimately be determined by optical projection devices. The photolithography process has a very important influence. One of the key technologies to realize the high-precision lithography process is exposure, and its precision directly affects the overlay accuracy and yield of the lithography machine. To achieve high-precision exposure, the position of the workpiece table must be precisely controlled. Generally, a lithography machine uses a plane mirror interferometer to measure the horizontal position of ...

AI Technical Summary

Problems solved by technology

[0005] The object of the present invention is to provide a method for eliminating the tilt error caused by the long mirror shape, to solve the tilt deviation caused by the unevenness of the long mirror shape, so as to avoid the wrong correction of the tilt condition of the workpiece table

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