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TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacturing method thereof

A technology of an array substrate and a manufacturing method, applied in the field of liquid crystal display, can solve the problems of source electrode and active layer transmission obstruction, and achieve the effects of reducing the number of processes, improving market competitiveness, and saving costs

Active Publication Date: 2011-08-10
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0019] The invention provides a method for manufacturing a TFT-LCD array substrate, and also solves the problem of transmission obstruction between the source electrode and the active layer in the prior art

Method used

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  • TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacturing method thereof
  • TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacturing method thereof
  • TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacturing method thereof

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Embodiment 1

[0086] figure 2 It is a flow chart of Embodiment 1 of the manufacturing method of the TFT-LCD array substrate of the present invention. Such as figure 2 Shown, the manufacturing method of TFT-LCD array substrate of the present invention comprises:

[0087] Step 1, depositing a first transparent conductive film and a first metal film on a transparent substrate, patterning a predetermined area, and forming a pattern including gate lines, gate electrodes, common electrodes and common electrode lines;

[0088] Step 2, depositing a gate insulating film, a semiconductor film and a doped semiconductor film, patterning a predetermined area, and forming a gate connection hole including a PAD area and a pattern of a semiconductor layer;

[0089] Step 3. Deposit the second metal film, pattern the predetermined area, deposit the second transparent conductive film, perform the lift-off process, and etch the second metal film and the doped semiconductor film in the predetermined area to...

Embodiment 2

[0118] Figure 22 It is a flow chart of Embodiment 2 of the manufacturing method of the TFT-LCD array substrate of the present invention. Such as Figure 22 Shown, the manufacturing method of TFT-LCD array substrate of the present invention comprises:

[0119] Step 100, depositing a first transparent conductive film and a first metal film on a transparent substrate, patterning a predetermined area to form a pattern including gate lines, gate electrodes, pixel electrodes and common electrode lines;

[0120] Step 200, depositing a gate insulating film, a semiconductor film, and a doped semiconductor film, patterning a predetermined area, and forming a pattern including via holes, gate connection holes in the PAD area, and a semiconductor layer;

[0121] Step 300, depositing a second metal film, patterning a predetermined area, depositing a second transparent conductive film, performing a lift-off process, and etching the second metal film and a doped semiconductor film in a pr...

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Abstract

The invention discloses a method for manufacturing a TFT-LCD (thin film transistor-liquid crystal display) array substrate, comprising the following steps of: depositing a first transparent conductive film and a first metal film on a transparent substrate, establishing composition of a picture on a set region, forming a pattern comprising a grid line, a grid electrode, a common electrode and a common electrode wire; depositing a grid insulation film, a semiconductor film and a doped semiconductor film, establishing the composition of the picture on the set region, forming a pattern comprisinga PAD region grid line connecting hole and a semiconductor layer; depositing a second metal film, establishing the composition of the picture on the set region, depositing a second transparent conductive film, carrying out a lift-off stripping process, and etching the second metal film and the doped semiconductor film of the set region to form the pattern comprising a source electrode, a drain electrode, a TFT trench and a pixel electrode. In the method for manufacturing the TFT-LCD array substrate disclosed by the invention, the TFT-LCD array substrate is manufactured by establishing the composition of the picture for three times; and compared with the prior art, the process number is reduced, the cost is greatly saved, and the market competitive force is improved.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to a TFT-LCD array substrate and a manufacturing method thereof. Background technique [0002] Thin Film Transistor Liquid Crystal Display (TFT-LCD for short) is a main flat panel display (Flat Panel Display, FPD for short). [0003] According to the direction of the electric field driving the liquid crystal, the TFT-LCD is divided into a vertical electric field type and a horizontal electric field type. Among them, the vertical electric field TFT-LCD needs to form pixel electrodes on the array substrate and the common electrode on the color filter substrate; however, the horizontal electric field TFT-LCD needs to form the pixel electrodes and common electrodes on the array substrate at the same time. Therefore, when manufacturing the array substrate of the horizontal electric field type TFT-LCD, it is necessary to add an additional patterning process for forming the common elec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L21/336H01L27/12G02F1/1362G02F1/1368
CPCH01L27/1288G02F2001/134372H01L27/1214G02F1/134372G02F1/13439G02F1/13458G02F1/1368
Inventor 宋泳锡崔承镇刘圣烈
Owner BOE TECH GRP CO LTD
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