Device for cleaning and treating substrate

A treatment device and water washing treatment technology, applied in the direction of spraying device, spraying device, cleaning method and utensils, etc., which can solve the problems of large occupied area of ​​replacement washing chamber 40, longer processing time, larger occupied area, etc.

Inactive Publication Date: 2011-09-21
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, since all the washing water used in the replacement washing chamber 40 is discarded, a large amount of washing water is used in the replacement washing chamber 40, resulting in a large amount of drain treatment.
Furthermore, since the water washing process is performed while moving the substrate W back and forth in the horizontal direction in the replacement water washing chamber 40, the processing time becomes longer.
In addition, since the size of the replacement washing chamber 40 in the substrate W transfer direction is longer than t

Method used

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  • Device for cleaning and treating substrate
  • Device for cleaning and treating substrate
  • Device for cleaning and treating substrate

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Embodiment Construction

[0055] Embodiments of the present invention will be described below with reference to the drawings.

[0056] figure 1 An example of an embodiment of the present invention is shown, and it is a diagram schematically showing a substrate cleaning processing apparatus 200 . Additionally, with Figure 11 The structural elements and components shown in the same or corresponding structural elements and components, in figure 1 The same reference numerals are also used in .

[0057] This substrate cleaning treatment apparatus 200 includes a water washing treatment chamber 10, a circulating water tank 116, and the like disposed on the rear stage side of the chemical solution processing unit 1 (only a part is shown in the figure), and a drying treatment unit is provided on the rear stage side of the water washing treatment chamber 10. (not shown).

[0058] The washing treatment chamber 10 is sequentially divided into a replacement washing area 201 , a washing area 202 , and a direct...

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PUM

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Abstract

The invention provides a device for cleaning and treating a substrate; when the substrate treated by liquid medicine is washed, the device can save the dosage of the purified water, reduce liquid emissions, shorten treating time, save space and reduce manufacturing cost. A washing treating room for washing the substrate treated through the liquid medicine is orderly divided into a replacing washing area, a washing area and a direct washing area in a transportation direction of the substrate; and an inlet spray nozzle, a high pressure nozzle, a forced discharging nozzle and an air nozzle are arranged in the replacing water area. The device is controlled so that the substrate sprays out the washing water from the inlet nozzle, the high pressure nozzle and the forced discharging nozzle before transported in the replacing washing area and stops spraying out the washing water from the inlet nozzle, the high pressure nozzle and the forced discharging nozzle after moved out the substrate from the replacing washing area.

Description

technical field [0001] The present invention relates to glass for liquid crystal display (LCD), plasma display (PDP), organic light emitting diode (OLED), field emission display (FED), vacuum fluorescent display (VFD), solar cell panels, etc. Substrates, glass / ceramic substrates for magnetic / optical disks, semiconductor wafers, electronic device substrates, etc., are cleaned after chemical liquid treatment such as resist film stripping treatment and etching treatment. Background technique [0002] In the manufacturing process of devices such as LCD, PDP, etc., after supplying various chemical solutions to the main surface of the substrate to perform chemical treatment such as resist film stripping treatment and etching treatment, when the substrate is subjected to water washing treatment, first, the replacement water washing process is performed. In the chamber (circulating water rinsing treatment section), cleaning water is supplied to the main surface of the substrate imme...

Claims

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Application Information

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IPC IPC(8): H01L21/00B08B3/02B05B1/04B05B1/14B05B1/28
CPCH01L21/67051H01L21/67706
Inventor 川上拓人
Owner DAINIPPON SCREEN MTG CO LTD
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