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Cleaning composition

A technology for cleaning compositions and compounds, applied in detergent compositions, non-surface-active detergent compositions, inorganic non-surface-active detergent compositions, etc., can solve the problems of insufficient removal of pollutants, secondary pollution, etc.

Active Publication Date: 2015-05-27
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the ability of this composition is also insufficient to remove pollutants like the composition disclosed in Japanese Examined Patent Publication No. sho.41-15116, and there is a concern of secondary pollution

Method used

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  • Cleaning composition
  • Cleaning composition
  • Cleaning composition

Examples

Experimental program
Comparison scheme
Effect test

example 1～5 and comparative example 1～6

[0031] (1) Preparation of cleaning composition

[0032] The components shown in Table 1 below were mixed in a predetermined ratio, thus preparing the cleaning compositions of Examples 1-5 and Comparative Examples 1-6.

[0033] (2) Evaluation of the Ability of Cleaning Compositions to Remove Impurities from Plastic Pipes

[0034] The plastic pipes to which bacterial impurities adhered were soaked in each of the cleaning compositions of Examples 1 to 5 and Comparative Examples 1 to 6, and stirred at a predetermined rate for 30 minutes. Observe the state of pollutants before and after immersion and stirring, and observe the surface state of the pipe and the transparency of the cleaning composition with the naked eye. The results are shown in Table 1 below and figure 1 Medium (using the cleaning composition of Example 1).

[0035] Table 1

[0036]

[0037]

[0038] Note) NaClO: sodium hypochlorite

[0039] NaOH: sodium hydroxide

[0040] TMAH: Tetramethylammonium Hydroxi...

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PUM

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Abstract

The invention discloses a cleaning composition which does not contain any sulfamic acid compound. Based on the total weight of the cleaning composition, the cleaning composition comprises the following components in percentage by weight: 0.1-20 percent of chloride-based oxidant, 0.1-20 percent of alkaline compound and the balance of water.

Description

technical field [0001] The present invention relates to a cleaning composition for removing contaminants from the interior of wet processing equipment. More particularly, the present invention relates to a cleaning composition for use in semiconductor or flat panel display (FPD) manufacturing processes and the like. Background technique [0002] In the manufacturing process of semiconductors or FPDs, most cleaning agents are ultrapure water, from which organic matter, inorganic matter, fine particles, and microorganisms dissolved in water have been removed as much as possible, and the ultrapure water Prepared to have a theoretical specific conductivity of 18.25 mega-ohms. In addition, wet chemicals such as strippers and etchants are used in addition to cleaning agents. Even though the ultrapure water is in a state with minimal bacteria and the cleaning process is not an open loop system, even microbes are present in the ultrapure water in minute quantities and the resultin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C11D7/32C11D7/10C11D7/06
Inventor 房淳洪尹嚆重金炳默
Owner DONGWOO FINE CHEM CO LTD