Magnetic field reinforced type linear ion source

Abstract

The invention belongs to the technical field of ion beams, and in particular relates to a magnetic field reinforced type linear ion source suitable for ion beam cleaning, ion beam etching and ion beam auxiliary depositing. The magnetic field reinforced type linear ion source comprises a cathode top plate, a cathode outer frame, central magnetic steel, peripheral magnetic steel, a gas channel, a water cooling anode and an insulation support. An ion beam lead-out hole comprises an annular groove arranged between a cathode top plate outer ring and a cathode top plate inner ring which form the cathode top plate; the central magnetic steel and the peripheral magnetic steel are respectively arranged at the middle and the periphery of the inside of the cathode outer frame, the cathode top plate,the cathode outer frame, the central magnetic steel and the peripheral magnetic steel form a closed annular discharge groove; and an anode is supported in the annular discharge groove through the insulation support and positioned below the annular ion beam lead-out hole, and the distance between the upper surface of the anode and the ion beam lead-out hole is above 5mm. The magnetic field reinforced type linear ion source has a long service life and capabilities of increasing the density of an extracted beam of an ion source, stably working under two working modes of high-voltage small-current and low-voltage large-current and working normally for a long time under a serious film-coating environment.

Description

technical field [0001] The invention belongs to the field of plasma technology and ion beam technology, in particular to an enhanced magnetic field type linear ion source suitable for ion beam cleaning, ion beam etching and ion beam assisted deposition. Background technique [0002] The anode layer linear ion source is widely used in ion etching, ion cleaning and ion beam assisted deposition processes in industry. The ions extracted from the ion source of the anode layer bombard the surface of the substrate to clean, activate and strengthen the surface of the material and eliminate static electricity. The collision between the energetic ions and the film-forming particles can transfer part of the energy to the film-forming particles, and the energy-carrying film-forming particles deposit on the surface of the substrate to form a dense film. This ion source does not require electron emitters (such as filaments, hollow cathodes, etc.), so it is especially suitable for working...

AI Technical Summary

Problems solved by technology

The usual anode layer ion source adopts the magnetic field structure of one magnetic steel, and the magnetic field strength is relatively low at the ion extraction slot, and the extraction beam current density is relatively low when working at low pressure

The distance between the anode and the cathode is relatively small, usually within 3mm. In the harsh coating environment, the short circuit of the cathode and anode electrodes is easy to occur, resulting in the ion source not working normally. In addition, the working pressure range of this ion source is narrow and cannot work stably. Two working modes: high voltage, low current and low voltage, high current

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