Processing method of silicon chip reworked after screen printing

A processing method and screen technology are applied in the processing field of reworked silicon wafers after screen printing, which can solve the problems of high dark current of cells, residual aluminum paste, lower production qualification rate and conversion efficiency of cells, etc. The effect of reducing aluminum residues on the surface of silicon wafers, reducing unqualified products, and improving solar energy conversion efficiency

Inactive Publication Date: 2012-01-04
浙江嘉毅能源科技有限公司
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Problems solved by technology

[0002] At present, the existing solar cells will produce a lot of reworked silicon wafers during the screen printing process. The traditional treatment method is manual cleaning with terpineol and alcohol, or ultrasonic cleaning with alcohol as a solvent. These t

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Embodiment Construction

[0006] The present invention will be further described below in conjunction with specific examples.

[0007] This a kind of processing method of reworking silicon chip after screen printing comprises the following steps:

[0008] 1. First, use alcohol and terpineol to manually clean the front and back of the silicon wafer.

[0009] 2. The silicon wafer is soaked in hydrochloric acid with a mass percentage concentration of 3-8% for 1-3 hours and taken out.

[0010] 3. Rinse the silicon wafer with deionized water to remove the residual hydrochloric acid on the surface of the silicon wafer.

[0011] 4. Soak the silicon wafer with water in alcohol for more than 20 seconds to dehydrate the surface of the silicon wafer.

[0012] By adopting the above steps, the actual test results show that the aluminum residue on the surface of the silicon wafer can be completely removed, so as to reduce the generation of unqualified products and improve the solar energy conversion efficiency of ...

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Abstract

The invention relates to a processing method of a silicon chip reworked after screen printing. The method comprises the following steps: cleaning the silicon chip by adopting alcohol mixed with terpineol; then putting the silicon chip in hydrochloric acid with the mass percent concentration of 3-8% and immersing for 1-3 hours; then removing the residual hydrochloric acid on the surface of the silicon chip by utilizing de-ionized water; and finally putting the wetted silicon chip into alcohol for soaking and dehydration. By adopting the method provided by the invention, the problem of aluminum being residual on the surface of the silicon chip of the screen printing reworked chip in the treating process can be reduced, the generation of rejected products is reduced, and the solar conversion efficiency of the silicon chip is improved.

Description

technical field [0001] The invention relates to a processing method for reworked silicon wafers after screen printing. Background technique [0002] At present, the existing solar cells will produce a lot of reworked silicon wafers during the screen printing process. The traditional treatment method is manual cleaning with terpineol and alcohol, or ultrasonic cleaning with alcohol as a solvent. These two methods will make some aluminum paste Residues on the surface of the silicon wafer will eventually cause the dark current of the cell to be high and the open circuit voltage to be low, thereby reducing the pass rate and conversion efficiency of cell production. Contents of the invention [0003] The object of the present invention is to provide a treatment method for reworking silicon wafers after screen printing, which can reduce aluminum residues on the surface of silicon wafers, thereby improving the solar energy conversion efficiency of silicon wafers. [0004] The te...

Claims

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Application Information

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IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 余俊浒李振段慰李德云童鹏飞徐新毅
Owner 浙江嘉毅能源科技有限公司
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