Method for improving stability and repeatability of extraction beam current of ion implanter

An ion implanter and stability technology, applied in discharge tubes, electrical components, circuits, etc., can solve the problems of variation, unsatisfactory stability and repeatability of the drawn beam, and achieve the effect of improving stability and repeatability

Active Publication Date: 2012-02-08
BEIJING SHUOKE ZHONGKEXIN ELECTRONICS EQUIP CO LTD
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AI Technical Summary

Problems solved by technology

[0003] The traditional ion implanter equipment used to adjust the working power of the filament power supply to control the arc current of the ion source when extracting the beam current, so as to ensure the stability and consistency of the beam current. This control method is

Method used

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  • Method for improving stability and repeatability of extraction beam current of ion implanter
  • Method for improving stability and repeatability of extraction beam current of ion implanter

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[0021] The invention will be further introduced below in conjunction with the drawings.

[0022] See figure 1 , figure 2

[0023] The whole method is divided into 3 parts: arc starting, optimization, closed loop adjustment

[0024] 1. Arcing:

[0025] Set the initial value of each power supply, set the initial value of the lead electrode

[0026] The ion source gas is supplied to ensure the best working pressure of the ion source cavity corresponding to the doping elements

[0027] Wait for each power supply to work stably, wait for stable air supply

[0028] Slowly reduce the current of the filament power supply and keep the other power supplies unchanged at the initial value of the arc until an arc current is generated.

[0029] Continue to slowly reduce the filament power supply current to find the best filament power supply current, so that the bias power supply power is gradually increased to obtain the largest and most stable arc current.

[0030] If the power of the bias power supp...

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Abstract

The invention discloses a method for improving stability and repeatability of an extraction beam current of an ion implanter, which comprises three parts: arc starting, optimizing, closed-loop regulation and the like. The method for improving the stability and the repeatability of the extraction beam current of the ion implanter has the biggest characteristics that an arc starting state can be kept be stable, and a multiple-arc starting state can be ensured to be repeated while the states of an ion source lamp filament, an arc chamber and other ion source components are slowly changed, thereby, the stability and the repeatability of the extraction beam current are effectively improved.

Description

technical field [0001] The invention relates to a method for extracting beams from an ion implanter, in particular to automatic beam extraction of an ion implanter, and belongs to the field of semiconductor device manufacturing. Background technique [0002] With the rapid development of integrated circuit manufacturing technology, higher and higher requirements are put forward for semiconductor process equipment. In order to meet the needs of new technologies, the ion implanter, one of the key equipment of the semiconductor ion doping process line, has a beam current index , Beam energy purity, injection depth control, injection uniformity and productivity need to be continuously improved. [0003] The traditional ion implanter equipment used to adjust the working power of the filament power supply to control the arc current of the ion source when extracting the beam current, so as to ensure the stability and consistency of the beam current. This control method is simple an...

Claims

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Application Information

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IPC IPC(8): H01J37/32
Inventor 唐景庭伍三忠孙勇罗宏洋
Owner BEIJING SHUOKE ZHONGKEXIN ELECTRONICS EQUIP CO LTD
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