X-ray fluorescence analyzer and X-ray fluorescence analysis method

一种分析装置、X射线的技术,应用在使用波/粒子辐射进行材料分析、测量装置、分析材料等方向,能够解决作业效率下降等问题,达到作业效率高、安全试样测定的效果

Active Publication Date: 2012-03-21
HITACHI HIGH TECH SCI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Moreover, in the existing fluorescent X-ray analysis, it is necessary to move the sample in the x-y direction while optically observing the device to align the position with the X-ray irradiation position, which will lead to a decrease in work efficiency.

Method used

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  • X-ray fluorescence analyzer and X-ray fluorescence analysis method
  • X-ray fluorescence analyzer and X-ray fluorescence analysis method
  • X-ray fluorescence analyzer and X-ray fluorescence analysis method

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Embodiment Construction

[0042] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in each drawing used in the following description, the scale is appropriately changed as necessary in order to make each component part recognizable in size.

[0043] figure 1 It is a block diagram showing the configuration of the fluorescent X-ray analysis apparatus 100 according to the first embodiment of the present invention. The fluorescent X-ray analysis device 100 is, for example, an energy-dispersive fluorescent X-ray analysis device, including: a sample stage 1 for holding a sample S, an X-ray vacuum tube (radiation source) 2, an X-ray detector 3, an analyzer 4, an observation System 5, focus switching drive mechanism 6, laser part 7, measuring head moving mechanism 8, control computer (equivalent to "moving mechanism control part", "laser part work control part", "altitude measurement mechanism work control" in the claims Department", "Observation...

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Abstract

The invention provides an X-Ray fluorescence analyzer and an X-ray fluorescence analysis method advantaged by high operating efficiency and safe sample measuring. The fluorescence analyzer (100) includes: a radioactive ray source (2) illuminating radioactive rays upon a radioactive point (P1) on a smapel (S); an X-ray detector (3); a moving mechanism (8) capable of moving the sample with respect to the radioactive ray source and the X-ray detector;an enclosure (10); a door (20) for opening and closing an opening (10a) for the sample into and out of the enclosure; a height measurement mechanism (7) capable of measuring a height at the irradiation point; a moving mechanism control unit (9) for adjusting a distance between the sample and the radiation source as well as the X-ray detector based on the measured height at the irradiation point; a laser unit (7) for irradiating the irradiation point with a visible light laser beam; a laser start control unit (9) for irradiating the visible light laser beam by the laser unit (7) when the door is open state; and a height measurement mechanism start control unit (9) for starting the height measurement mechanism to measure the height at the irradiation point when the door is opened.

Description

technical field [0001] The present invention relates to a fluorescent X-ray analysis device and a fluorescent X-ray analysis method for performing fluorescent X-ray analysis and the like on the surface of a sample. Background technique [0002] Fluorescent X-ray analysis is to irradiate the sample with the X-rays emitted by the X-ray source, and the characteristic X-rays (fluorescent X-rays) emitted by the sample are detected by the X-ray detector, and the spectral lines are obtained from the energy, so that the sample is analyzed. Methods of qualitative or quantitative analysis. Fluorescent X-ray analysis is widely used in engineering / quality control, etc., because it does not damage the sample and can be analyzed quickly. In recent years, fluorescent X-ray analysis has achieved high precision / high sensitivity, enabling micro-measurement, and is expected to spread especially as an analysis method for detecting harmful substances contained in materials or composite electron...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/223
CPCG01N23/223G01N2223/076
Inventor 长谷川清一宫丰泷口英树
Owner HITACHI HIGH TECH SCI CORP
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