Polycrystalline silicon reduction furnace with 48 pairs of rods
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SHUANGLIANG NEW ENERGY EQUIP
- Publication Date
- 2012-03-28
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a reduction furnace for producing polysilicon, in particular to a reduction furnace for producing polysilicon by electrochemical reaction. It belongs to the technical field of polysilicon preparation. Background technique
[0002] Polycrystalline silicon is the direct material for the production of monocrystalline silicon, and high-purity polycrystalline silicon is the basic material for semiconductor devices such as photoelectric conversion cells and integrated circuits. With the rapid development of the world's semiconductor industry, a large number of applications of ultra-large-scale integrated circuits, and a large demand for photovoltaic cells, the demand for polysilicon in the whole world is increasing significantly.
[0003] The polysilicon reduction furnace is the main equipment for producing polysilicon, and the polysilicon reduction furnace is also a high energy consumption equipment. Therefore, the quality of the ...