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Method for coating films on focusing mirrors

A mirror and magnetron sputtering technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., to achieve the effect of eliminating uneven film thickness, easy control of deposition process, and high coating efficiency

Inactive Publication Date: 2012-04-11
STARARC COATING TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the invention is to propose a coating method for focusing reflectors of solar photoelectric devices, which solves the problem of uniformity of film thickness

Method used

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  • Method for coating films on focusing mirrors
  • Method for coating films on focusing mirrors
  • Method for coating films on focusing mirrors

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] A kind of coating method of focusing reflector of the present embodiment, such as figure 2 shown, including the following steps:

[0022] Step 1: Place four focusing mirrors 1 to be coated evenly on a horizontal turntable 2, the turntable 2 is located in a vacuum chamber 4 with a magnetron sputtering target 3 on an inner wall, and the focusing mirror 1 is surrounded by The center of the formed regular polygon coincides with the center of circle of the turntable 2 to ensure that the coating surface of each focusing mirror 1 is parallel to the target surface of the magnetron sputtering target 3 and the distance is equal; select Ti or TiO 2 The coating material is used as the target;

[0023] Step 2: mark a position indicator mark 5 on the turntable 2 of step 1, and make the position indicator mark 5 be in an initial position before the coating starts;

[0024] Step 3: Seal the vacuum chamber 4, start the vacuum acquisition system, and the vacuum degree in the vacuum ch...

Embodiment 2

[0031] The method of this embodiment is similar to that of Embodiment 1, except that the target material of the magnetron sputtering target is Si or SiO 2 , so no more details.

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Abstract

The invention discloses a method for coating films on focusing mirrors. The method comprises the following steps: 1. putting focusing mirrors to undergo film coating on a horizontal rotary table uniformly and selecting a target; 2. ensuring a marked position indication sign to be in an initial position before film coating; 3. sealing a vacuum chamber and starting a vacuum acquirement system; 4. filling a reacting gas; 5. keeping a baffle of a magnetron sputtering target closed and switching on a sputtering power supply to begin pre-sputtering; 6. setting the rotating speed of the rotary table while opening the baffle and starting the rotation of the rotary table to begin film coating timing at the moment; and 7. when the film coating time is achieved and the position indication sign returns to the initial position, immediately closing the baffle and then switching off the sputtering power supply and stopping the rotation of the rotary table to coating films on the focusing mirrors. The problem that the thickness of the films coated on the focusing mirrors is nonuniform is solved by using the method.

Description

technical field [0001] The invention relates to the field of film coating, in particular to a film coating method for focusing reflectors of solar photoelectric devices. Background technique [0002] The structure of the focusing reflector 2 of the solar photoelectric device is a spherical crown, such as figure 1 As shown, the projection of the surrounding area on the plane is a square, the section is arc-shaped, and a circular hole 101 is formed in the middle. The inner spherical surface is vacuum-plated with a layer of high-reflection film with uniform thickness, while the outer spherical surface is not allowed to be coated. Commonly used coating methods are evaporation and magnetron sputtering coating technology. Magnetron sputtering coating has the characteristics of good uniformity, good deposition rate consistency and strong controllability. It is the best choice. However, due to the structure of the focusing mirror and the particularity of the PVD coating equipment,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
Inventor 乐务时钱涛
Owner STARARC COATING TECH SUZHOU
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