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Rectangular plane cathode arc evaporation source of combination magnetic fields

A technology of arc evaporation and planar cathode, which is applied in the direction of vacuum evaporation plating, circuit, discharge tube, etc., can solve the problems of insufficient arc spot movement area, difficulty in obtaining flat dome shape, and large splashing droplets, etc., to achieve improved Target utilization, convenient regulation, and the effect of heat dissipation on the target surface

Active Publication Date: 2014-04-16
DONGGUAN HUICHENG VACUUM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Cathodic arc deposition is one of the mainstream technologies for ion plating hard film at present. Because of its high plasma concentration, high ionization rate, large particle energy, fast deposition speed, good film-base bonding force, and good film quality, it has been widely used. Application; the disadvantage is that the film layer has macroscopic (large) particles of coating materials, and the surface is rough
[0007] Generally speaking, the traditional permanent magnet or electromagnetic coil structure design is limited by the shape and arrangement of the magnet or coil components, and it is difficult to obtain the shape of the magnetic force line with a flat arched hole with a wide drop channel, especially in the central area of ​​the target surface , the surrounding edge area, and the four-sided corner area are not in the magnetic field line tunnel, and the arc spot rarely enters these areas, so the target utilization rate is low, generally only about 20-25%
Because the moving area of ​​the arc spot is not large enough, the heat on the target surface is relatively concentrated, the temperature rise of the target surface is relatively high, the splashed liquid droplets are larger and more, and the film layer is rough

Method used

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  • Rectangular plane cathode arc evaporation source of combination magnetic fields
  • Rectangular plane cathode arc evaporation source of combination magnetic fields
  • Rectangular plane cathode arc evaporation source of combination magnetic fields

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Embodiment Construction

[0024] The present invention will be further described below in conjunction with accompanying drawing:

[0025] Such as figure 1 , 2 As shown, the rectangular planar cathodic arc evaporation source of the combined magnetic field of the present invention comprises a rectangular target plate 8, a cooling water tank plate 7, a magnetically conductive sheet 6, a magnetically conductive armature 2, a target base plate 1, a central axis permanent magnet 9, Four end angle permanent magnets 13, at least two oblong electromagnetic coils; the target base plate 1 supports the entire arc evaporation source, the target base plate 1 is provided with a magnetically conductive armature 2, and the magnetically conductive armature 2 faces one side of the target base plate 1 It is a plane, and the other side is convex and concave. Several grooves are provided on the upper surface of the magnetically conductive armature 2. The central axis permanent magnet 9, the end angle permanent magnet 13 an...

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Abstract

The invention discloses a rectangular plane cathode arc evaporation source of combination magnetic fields, which comprises a rectangular target material flat plate. A middle shaft permanent magnet, four end corner permanent magnets and at least two long circular electromagnetic coils are arranged right below the target material flat plate at the position a certain distance away from the target material flat plate. The electromagnetic coils are parallelly arranged along the edge of the target material flat plate in annular sleeving mode and are connected with an adjustable direct current power supply through wires, the four end corner permanent magnets are respectively arranged at the positions of four end corners, wherein the middle shaft permanent magnet is arranged on the inner side of the electromagnetic coil on the innermost side along the long axial direction, the magnetic fields formed by the middle shaft permanent magnet, the end corner permanent magnets and the electromagnetic coils have the same polarity. The rectangular plane cathode arc evaporation source of combination magnetic fields can achieve high utilization rate of a target material and form fine and smooth film layers no matter magnetizing current is changed or not.

Description

technical field [0001] The invention relates to a vacuum cathodic arc deposition technology for ion plating, in particular to the magnetic field structure design of a large-area rectangular planar cathodic arc source. Background technique [0002] Cathodic arc deposition is one of the mainstream technologies of ion plating hard film at present. Because of its high plasma concentration, high ionization rate, large particle energy, fast deposition speed, good film-base bonding force and good film quality, it has been widely used. Application; its disadvantage is that the film layer has macroscopic (large) particles of plating material, and the surface is rough. Cathodic arc deposition is the use of cathodic arc evaporation source to evaporate the target material to generate plasma deposition and film formation. The principle is to use vacuum arc discharge to generate fine arc arc spots on the target surface, and the arc spots are emitted through the high temperature---field ef...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32H01J37/32
Inventor 李志荣李志方罗志明李秋霞
Owner DONGGUAN HUICHENG VACUUM TECH
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