Slit flow stability control device

Abstract

The invention discloses a slit flow stability control device, which is characterized in that: the slit flow stability control device is arranged between a lens system and a base, and a diversion trench array is arranged below a liquid injection cavity and two ends and the outside of a recovery cavity are provided with internal recovery damping row holes and external recovery damping raw holes, so that the stable and reliable liquid continuous updating state in an observation area is maintained. A liquid input into the liquid injection cavity forms jet flow uniformly pointing to the recover cavity and flows uniformly and stably under the guidance of the diversion trench array. Under the working condition that the base moves, the internal recovery damping row holes have an effect of assisting in recovery, and the external recovery row holes absorb possibly leaked liquid drops in real time, so that a multi-layer liquid recovery barrier is formed. In addition, a seal is not required at the periphery of a flow field of the device, a system is simplified, the impact of extra energy on the boundary of the flow field is avoided, and the system has high stability and reliability.

Description

technical field [0001] The invention relates to a slit flow stability control device in an immersion microscope system, in particular to a slit flow stability control device for an immersion microscope (Immersion Microscope). Background technique [0002] In industries such as semiconductors, fault analysis and reliability evaluation of tiny electronic devices are the key to ensuring yield. The usual way is to use the electronic device as a sample and observe it under a microscope to determine whether there are defects or impurities that affect the normal operation of the device. However, as the characteristic line width of electronic devices continues to shrink below 32 nanometers, and the size of substrates (such as semiconductor silicon wafers) continues to increase, the technical cost of traditional observation methods is rising rapidly. [0003] The immersion microscope system, by filling the gap between the front end of the objective lens and the substrate (such as si...

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Problems solved by technology

[0006] 2) The currently used liquid supply recovery structure is not stable and reliable enough under the condition of continuous liquid renewal

However, the way of applying energy, while suppressing the leakage of the boundary liquid, also aggravates the instability of the boundary

Especially under the condition that the substrate moves rapidly from the observed area to the next observed area, if there is no effective control, the gas sealing method will easily lead to the entrainment of air bubbles into the flow field, while the liquid sealing method may cause the sealing liquid to be drawn into the observation area. in the area and interfere with the observation

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