On-line testing structure for polycrystalline silicon material residual stress
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A technology of residual stress and online testing, which is applied in the fields of material resistance, force/torque/power measuring instrument, semiconductor/solid-state device testing/measurement, etc. The effect of simple signal loading and measurement, simple method, and low requirements for test equipment
Inactive Publication Date: 2014-01-29
SOUTHEAST UNIV
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[0002] The performance of microelectromechanical devices is closely related to material parameters. Due to the influence of processing, some material parameters will change. These uncertain factors caused by processing technology will make device design and performance prediction uncertain and unstable. Case
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[0012] The present invention will be further described below in conjunction with the accompanying drawings.
[0013] Such as figure 1 and figure 2 As shown, the polysilicon material residual stress on-line testing structure of the present invention includes three deflection pointers with the same basic structure, and each deflection pointer includes a horizontal driving beam 101, 103, 105, and a vertical driving beam 101, 103, 105. pointers 102, 104, 106 and two anchor regions fixed on the substrate, and the two anchor regions respectively fix one end of the driving beam 101, 103, 105 and one end of the pointer 102, 104, 106. The main body of the test structure is fabricated from polysilicon material.
[0014] The three polysilicon deflection pointers are placed in the shape of "pin", and the pointers 102, 104, and 106 all point to the center; the upper polysilicon deflection pointer includes the driving beam 101, the pointer 102, the anchor areas 107, 108 and the metal ele...
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Abstract
An online test structure for the residual stress of a polycrystalline silicon material, comprising three deflecting pointers of polycrystalline silicon having substantially the same structure, the three deflecting pointers of polycrystalline silicon being arranged in a delta shape with all pointers pointing to the centre. Each deflecting pointer comprises a horizontal driving beam (101, 103, 105), a pointer (102, 104, 106) perpendicular to the driving beam (101, 103, 105), and two anchoring regions fixed on a substrate, the two anchoring regions (107, 108, 109, 110, 111, 112) fixing one end of the driving beam (101, 103, 105) and one end of the pointer (102, 104, 106) respectively. By controlling the initial direction of deflection of the pointer under the action of the residual stress, the maintenance and change in distance can effectively reflect the amount and properties of the residual stress. During testing, heat driving is utilised, and the measured parameters are the electrical resistance of the front and rear driving beams for heat driving. The measurement and calculation do not require a thermal expansion co-efficient, avoiding the effect of errors in the measurement results during online testing of the thermal expansion co-efficient.
Description
technical field [0001] The invention relates to an on-line testing structure for polysilicon material residual stress, and belongs to the technical field of on-line testing of micro-electromechanical systems (MEMS) material parameters. Background technique [0002] The performance of microelectromechanical devices is closely related to material parameters. Due to the influence of processing, some material parameters will change. These uncertain factors caused by processing technology will make device design and performance prediction uncertain and unstable. Case. The purpose of online testing of material parameters is to measure the material parameters of MEMS devices manufactured by a specific process in real time, monitor the stability of the process, and feed back the parameters to the designer so that the design can be corrected. Therefore, online testing without leaving the processing environment and using general-purpose equipment has become a necessary means of proce...
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