Method and device for processing monitoring alarm and plasma processing device

Abstract

The invention provides a method and a device for processing monitoring alarm and a plasma processing device. The method for processing the monitoring alarm comprises obtaining toleration times according to monitoring cycles and toleration time which corresponds to a certain continuous time section in the technological process; obtaining monitoring values of monitored parameters according to the monitoring cycles; judging whether the monitoring values obtained each time are within a preset normal value range, if the monitoring values obtained each time are within the preset normal value range, adding one to abnormal times, and if the monitoring values obtained each time are not within the preset normal value range, zero clearing the abnormal times; and judging whether the abnormal times accumulated within the certain continuous time section in the technological process are larger than or equal to the toleration times, if the abnormal times accumulated within the certain continuous time section in the technological process are larger than or equal to the toleration times, executing safety actions, and giving out alarming signals. The method for processing the monitoring alarm only executes the safety actions and gives out the alarming signals when the abnormal times of an air pressure value in an input pipeline of a quality flow controller continuously reach the toleration times. Therefore, the method for processing the monitoring alarm is strong in anti-jamming performance.

Description

technical field [0001] The invention belongs to the field of plasma processing equipment, and relates to a monitoring and alarm processing method, device and plasma processing equipment. Background technique [0002] In the process of using plasma processing equipment to process products such as semiconductors and solar cells, it is often necessary to input corresponding process gases into the reaction chamber by means of a gas supply system. Generally, the gas supply system includes a gas source, a pressure regulating valve (Regulator), a pressure transmitter (PT, Pressure Transmitter) and a mass flow controller (MFC, Mass Flow Controller). The gas source, pressure regulating valve, mass flow controller and reaction chamber are connected in sequence through gas pipelines. The pressure transmitter is used to monitor the gas pressure value in the pipeline at the input end of the mass flow controller, and send the monitored pressure signal representing the gas pressure value ...

AI Technical Summary

Problems solved by technology

[0009] In step s2, when the communication signal between the pressure transmitter and the device where the monitoring thread is located is disturbed or the gas pressure in the pipeline at the input end of the mass flow controller fluctuates, the monitoring thread will obtain the wrong gas pressure value, resulting in The monitoring thread falsely throws an alarm signal, which not only adversely affects the process, reduces the stability of the plasma equipment operation, but also increases the workload of maintenance personnel

In addition, the above-mentioned monitoring thread starts to work after the system software is started, that is, monitors the gas pressure at the input end of the mass flow controller. Therefore, even if the plasma processing equipment is in a non-process state, the monitoring thread may also throw an alarm signal, and the maintenance personnel The equipment has to be maintained, increasing the workload of maintenance personnel

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