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Production plant with polycrystalline silicon reduction furnaces and operation method

A production device and reduction furnace technology, applied in chemical instruments and methods, silicon compounds, sustainable manufacturing/processing, etc., can solve problems affecting reaction rate and conversion rate, uneven mixing, increasing costs, etc., to reduce tail gas treatment The effect of increasing the amount, increasing the residence time, and saving production costs

Active Publication Date: 2013-07-10
TIANJIN UNIV
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Problems solved by technology

First, because the reactants need to be heated in the reduction furnace, in order to prevent the heated gas from leaving the reduction furnace without reacting, the feed flow rate of the reactants is generally low, resulting in very weak turbulence of the reactants in the furnace, and the mixed It is very uneven, which affects the reaction rate and conversion rate; secondly, because the single-pass conversion rate of the reaction is very low, the reaction tail gas containing a large amount of raw material gas needs to be processed in the subsequent separation and purification section, and such a process is bound to increase production cost

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  • Production plant with polycrystalline silicon reduction furnaces and operation method

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Embodiment Construction

[0014] Taking the production process of polysilicon produced by three polysilicon reduction furnaces as an example, the main technical features of the production device and operating method that meet the technical requirements of the present invention are described as follows:

[0015] Such as figure 1 As shown, the reaction device comprises polysilicon reduction furnace I (1), polysilicon reduction furnace II (2), polysilicon reduction furnace III (3), Venturi injection device (4), cooler (5), automatic control system (6 ), fresh raw material pipeline (7), total feed pipeline (8), tail gas recovery pipeline (9), reusable material pipeline (10). The inlet pipelines of the three polysilicon reduction furnaces are all connected to the total feed pipeline (8), and the discharge pipelines of the three reduction furnaces are connected to the tail gas recovery pipeline (9) and the recyclable material pipeline (10). The furnace implements unified feeding and unified discharging. Th...

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Abstract

The invention provides a production plant with a plurality of polycrystalline silicon reduction furnaces and an operation method. The production plant comprises the polycrystalline silicon reduction furnaces, a cooler, a set of Venturi injection device, a set of automatic control system and a plurality of material pipelines; inlet pipelines of the reduction furnaces are all connected with a mainfeeding pipeline, and outlet pipelines are connected with a tail gas reclaiming pipeline and a recycled material pipeline which can be switched through the automatic control system; the recycled material pipeline is connected to the Venturi injection device through the cooler; and the Venturi injection device is arranged at the front end of the main feeding pipeline. When a reaction starts, the outlet pipelines of the furnaces are communicated with the recycled material pipeline, reaction tail gas from the recycled material pipeline is cooled by the cooler, then enters the Venturi injection device, and finally enters the main feeding pipeline after being mixed with fresh feed gas; after the conversion rate reaches 15% to 20%, the outlet pipelines of the furnaces are switched to be connected to the tail gas reclaiming pipeline by the automatic control system, and then the reaction tail gas enters the follow-up tail gas treatment procedure.

Description

technical field [0001] The invention belongs to the technical field of polysilicon production, in particular to a production device and an operation method of a plurality of polysilicon reduction furnaces proposed for the reduction section of trichlorosilane. Background technique [0002] At present, the main process technology for polysilicon production at home and abroad is the improved Siemens method. The core step of this process technology - the reduction reaction of trichlorosilane is carried out in the polysilicon reduction furnace: firstly, high-purity trichlorosilane and hydrogen are mixed in proportion and then passed into the polysilicon reduction furnace, and then at a certain temperature (1080°C ~ 1150°C) and under pressure, the deposition reaction is carried out on the energized high-temperature silicon core to generate polysilicon; among them, the single furnace (single polysilicon reduction furnace) conversion rate of the key reactant component trichlorosilan...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/035
CPCY02P20/10
Inventor 刘春江段长春黄哲庆周阳段连王晓静
Owner TIANJIN UNIV
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