Check patentability & draft patents in minutes with Patsnap Eureka AI!

Exposure method and exposure apparatus

A technology of exposure device and exposure method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problems that have not been recorded, and have not taken into account the suppression of light source consumption, power consumption, and light source fluctuations, etc., to achieve the suppression of temperature rise , The effect of suppressing power consumption and reducing the burden

Inactive Publication Date: 2012-07-18
HITACHI HIGH-TECH CORP
View PDF7 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In the light source system for an exposure device using LEDs as the light source described in Patent Document 1, a simple and inexpensive device can be realized by changing the light source from the conventional method of using a lamp to a structure in which a plurality of LEDs are arranged two-dimensionally. Restraining the power consumption of the light source and responding to fluctuations in the light intensity of the light source are not taken into account
[0008] In addition, in the lighting device using a plurality of LEDs as a light source described in Patent Document 2, although it is described that the LED is driven at a duty ratio of less than 100% to improve the heat dissipation effect and improve the luminous efficiency, it does not describe the exposure device as It is necessary to ensure the necessary exposure amount within one exposure time in the state where the luminous efficiency is improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Exposure method and exposure apparatus
  • Exposure method and exposure apparatus
  • Exposure method and exposure apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] FIG. 1 schematically shows an exposure apparatus according to a first embodiment of the present invention. In addition, in the following description, two directions parallel to and perpendicular to the photosensitive surface of the glass substrate as the object to be exposed are defined as the X axis and the Y axis, and the direction in which the exposure beam is perpendicularly incident on the glass substrate is defined as for the Z axis. In addition, regarding the X-axis, Y-axis, and Z-axis, the directions indicated by the arrows in FIG. 1 are each positive.

[0030] The exposure apparatus 1 of the present embodiment includes a light source module 2 , an exposure stage 8 , an LED lighting unit 12 , a stage drive unit 18 , a substrate insertion / extraction unit control unit 19 , a controller 10 , and a memory 11 .

[0031] The light source module 2 has: an LED light source 22, which arranges ultraviolet LEDs 21 two-dimensionally at predetermined intervals on the XY pla...

Embodiment 2

[0068] An exposure apparatus according to Example 2 of the present invention will be described. The structure of the exposure apparatus in this example is the same as that shown in FIG. 1 described in Example 1. FIG.

[0069] In addition, the operation flow of the exposure device in this embodiment is the same as figure 2 The procedures described in Example 1 are the same. Figure 7 Exposure conditions in step S103 of the operation flow are shown. exist Figure 8 expressed in Figure 7 The exposure conditions shown are changes in temperature detected by the temperature sensor 24 when the LED light source 22 is turned on.

[0070] Figure 7 The graph shown is an example in which the exposure in step S103 is performed in one pulse. By making the energization time of one pulse instantaneous, since the exposure intensity is high, the total exposure light amount reaches the exposure light amount required for the glass substrate 3 coated with the photosensitive agent as the o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides an exposure method and an exposure apparatus. In order to reduce the number of LED elements used in an LED light source and provide a small-sized and low-cost light source which is used for exposure and can obtain sufficient amount of light in a short time, the exposure apparatus comprises: an exposure-used light source unit used for emitting exposure light; a stand unit used for bearing an exposure-used substrate and capable of moving in a plane; and a control unit used for controlling the stand unit and the exposure-used light source unit. The exposure-used light source unit has a two-dimensional light source part in which a plurality of light emitting elements are arranged. When the exposure-used light source unit performs exposure for the exposure-used substrate born on the stand unit with a predetermined exposure light summation within a predetermined time, the control unit controls the light source part, on one hand, to change irradiation conditions in order, on the other hand, to enable a plurality of pulsed lights emitted from the light source part to irradiate the exposure-used substrate.

Description

technical field [0001] The present invention relates to an exposure method and an apparatus thereof for exposing a circuit pattern drawn on a mask on a substrate. Background technique [0002] Previously, exposure devices used ultra-high pressure mercury lamps as light sources. Then, the circuit pattern is exposed to the substrate fixed on the exposure table with light irradiated from the ultra-high pressure mercury lamp. [0003] However, ultra-high pressure mercury lamps generally have a short life. Therefore, there is a problem that the user must frequently perform replacement work and light intensity adjustment work accompanying the replacement, which is troublesome. In addition, it takes time for an ultra-high pressure mercury lamp to irradiate with a stable amount of light after the power is turned on, and therefore, the exposure operation cannot be started immediately after the device is started. Furthermore, since the ultra-high pressure mercury lamp needs to be t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/2047G03F7/70008G03F7/70191G03F7/70275G03F7/70391G03F7/70458
Inventor 石田进手塚秀和土井秀明斋藤佳大根本亮二
Owner HITACHI HIGH-TECH CORP
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com