Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Automatic cleaning device for exhaust duct and gluing and developing cabinet

An exhaust duct, automatic cleaning technology, applied in the direction of cleaning hollow objects, cleaning methods and utensils, photoengraving process coating equipment, etc. Manpower, the effect of reducing downtime

Active Publication Date: 2012-07-25
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide an automatic cleaning device for exhaust pipes and a glue-coating and developing machine to solve the cumbersome problem of dismantling and cleaning the existing exhaust pipes

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automatic cleaning device for exhaust duct and gluing and developing cabinet
  • Automatic cleaning device for exhaust duct and gluing and developing cabinet
  • Automatic cleaning device for exhaust duct and gluing and developing cabinet

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0019] see figure 2 , figure 2 Shown is a schematic structural view of the exhaust pipe automatic cleaning device and the gumming and developing machine of the present invention. Depend on figure 2 It can be seen that the gluing and developing machine platform provided in this embodiment includes a gluing chamber 20, a wafer carrier 21, an exhaust duct 22, and an exhaust duct automatic cleaning device arranged on the exhaust duct 22. The wafer carrier table 21 is located at the central position of the gluing chamber 20, the wafer is placed on the wafer carrier table 21, the exhaust pipe 22 is arranged at the bottom of the gluing chamber 20, and It communicates with the gluing chamber 20 .

[0020] read on figure 2 , the automa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Angleaaaaaaaaaa
Login to View More

Abstract

The invention relates to the field of semiconductor photolithography and provides an automatic cleaning device for an exhaust duct, the automatic cleaning device is arranged on the exhaust duct of a gluing and developing cabinet, the exhaust duct is a bent pipe formed by connecting a first pipe and a second pipe, the first pipe is communicated with a gluing chamber in the gluing and developing cabinet, the automatic cleaning device for an exhaust duct includes a nozzle externally connected with a cleaning solvent source and a fluid drain pipe, the nozzle is arranged on the inner wall of the first pipe, and the fluid drain pipe is connected with the lower part of the first pipe and communicated with the first pipe. The invention further provides a gluing and developing cabinet, including a washer bearing table arranged inside the gluing chamber and an exhaust duct communicated with the gluing chamber, the exhaust duct is provided with the automatic cleaning device for an exhaust duct. Via the nozzle, cleaning solvent can be sprayed to the first pipe of the exhaust duct, on which photo-resist dust particles are accumulated easily, in order to timely clean photo-resist dust particles accumulated on the inner wall of the exhaust duct without dismounting the exhaust duct.

Description

technical field [0001] The invention relates to the field of semiconductor photolithography, in particular to an automatic cleaning device for an exhaust pipe and a glue-coating and developing machine. Background technique [0002] The rubber coating and developing machine in the process of semiconductor lithography, its structure is as follows figure 1 As shown, it includes a gluing chamber 10, a wafer carrier 11 and an exhaust duct 12, the wafer carrier 11 is arranged inside the gluing chamber 10, and a wafer is placed on the wafer carrier 11, at present, the exhaust pipe 12 is an elbow composed of a vertical pipe 121 and a horizontal pipe 122 connected to each other, and the vertical pipe 121 communicates with the glue chamber 10 for Discharge the gas in the gluing chamber. During the gluing process, the gluing and developing machine uses a high-speed rotating motor to drive the wafer carrier 11 to rotate. During this process, about 80% of the photoresist will be thrown ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B08B9/032G03F7/16
Inventor 凌意明周孟兴江瑞星王逸尔
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products