Reticle stage vertical measuring apparatus
A technology of measuring device and mask table, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve insulation problems and other problems, and achieve the effect of reducing design complexity and processing cost
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Embodiment 1
[0026] refer to figure 1 As shown, the mask table of the lithography machine mainly includes: plate holder 101, two sets of air bearings 102, marble platform 103, laser interferometer measurement system 104, two sets of Y-direction micro-motors 105, driving arm 106, X-direction Micro motor 107, reticle 109. The reticle 109 is placed on the plate holder 101 , two groups of Y-direction micromotors 105 complete the Y-direction movement function of the reticle 109 , and X-direction micromotors 107 complete the X-direction movement function of the reticle. The stators of the two sets of Y-direction micromotors and the stators of the X-direction micromotors are all fixed on the driving arm 106, and the movers are all connected to the plate carrier 101. There is no physical connection between the stators of the motors and the movers. Only the magnetic force generated by the current drives the mover to complete the micro-movement function. The laser interferometer measurement system...
Embodiment 2
[0030] The platform structure involved in the vertical measurement device of the mask table can also adopt Figure 4 The structure shown mainly includes a stage body 401 , an insulating insert 402 , a conductive film 403 , a capacitive sensor 404 and an objective lens top module 405 . The stage body 401 , the insulating insert 402 and the conductive film 403 constitute the mask stage stage 101 . Capacitive sensors 403 are fixed on the top module 404 of the objective lens, and the number thereof can be determined by actual measurement requirements. The insulating insert 402 is fixed on the bottom of the plate holder body 401, and an air-floating structure is designed on the insulating insert, and then four groups of mutually independent conductive films (such as gold films) are plated on the insulating insert 402, Ensure that the four sets of conductive films are insulated from each other and the effectiveness of the measurement signal. The insulating insert 402 is made of a ...
Embodiment 3
[0032] The plate platform structure involved in the mask table vertical measurement device can also be determined by Figure 5composed of the structure shown. The vertical measurement device mainly includes a stage body 501 , an insulating film 502 , a conductive film 503 , a capacitive sensor 504 and an objective lens top module 505 . The stage main body 501 , the insulating film 502 and the conductive film 503 constitute the mask stage stage 101 . The capacitive sensors 503 are fixed on the top module 504 of the objective lens, and the number thereof can be determined by actual measurement requirements. An insulating film 502 is plated on the bottom of the plate holder body 501, and then four sets of independent conductive films (such as gold films) are plated on the insulating film 502 to ensure the mutual insulation of the four sets of conductive films and the validity of the measurement signal. The insulating film 502 is made of a material with extremely low electrical ...
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